Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Ryugo Hikichi"'
Publikováno v:
Photomask Technology 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e2bc5b36a68f1867e699c9b158fc6687
https://doi.org/10.1117/12.2643250
https://doi.org/10.1117/12.2643250
Publikováno v:
Emerging Patterning Technologies.
Nanoimprint lithography, NIL, is gathering much attention as one of the most potential candidates for the next generation lithography for semiconductor. This technology needs no pattern data modification for exposure, simpler exposure system, and sin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1382d9f1e93a40fc85c78d15a146a5e0
https://doi.org/10.1117/12.2263460
https://doi.org/10.1117/12.2263460
Autor:
Mochihiro Shimizu, Hidekazu Migita, Hiroyuki Ishii, Hiroyuki Iwashita, Masahiro Hashimoto, Masao Ushida, Toshiyuki Suzuki, Morio Hosoya, Hideaki Mitsui, Yasushi Ohkubo, Tsugumi Nagano, Ryugo Hikichi, Noriko Kakehi, Hideyoshi Takamizawa
Publikováno v:
SPIE Proceedings.
193nm-immersion lithography is the most promising technology for 32nm-node device fabrication. At the 32nm technology-node, the performance of photomasks, not only phase-shift masks but also binary masks, needs to be improved, especially in "resoluti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fecda67f10a80cbf3539e23b07c6e8ed
https://doi.org/10.1117/12.793014
https://doi.org/10.1117/12.793014
Autor:
Yukihiro Sato, Ryugo Hikichi, Shuichi Sanki, Yasuyuki Kushida, Kiyoshi Ogawa, Akihiko Naito, Naoyuki Ishiwata, Hironori Sasaki, Hiroshi Maruyama
Publikováno v:
SPIE Proceedings.
Shrinking of pattern size on photomask requires tight control on defects and CD qualities. Recent ultra resolution lithography requires tight criteria for defect. In this paper, we describe the main defect factor "re-adsorption of resist" on. This is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ffcf4de9d957ce5f50f1e5664858887
https://doi.org/10.1117/12.633668
https://doi.org/10.1117/12.633668
Autor:
Carlo Pogliani, Giovanni Bianucci, Gian Luca Cassol, Luigi Raffaele, Shoichi Murata, Ryugo Hikichi, Shiaki Murai, Hidenao Katsuki, Shigeru Noguchi
Publikováno v:
SPIE Proceedings.
The advanced Jeol JBX9000MVII 50kV electron-beam lithography system has been successfully installed at DNP Photomask Europe and timely qualified for the 90nm technology node. The overall performances of this writing tool have thoroughly been assessed
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8733728abc430f703ef82c01c7c0dc31
https://doi.org/10.1117/12.632399
https://doi.org/10.1117/12.632399
Autor:
Satoru Asai, Shigeru Noguchi, Yoji Kawasaki, Hiroyuki Miyashita, Yukihiro Sato, Yutaka Miyahara, Ryugo Hikichi, Hitoshi Handa, Minoru Naito, Hiroshi Maruyama, Yasuyuki Kushida
Publikováno v:
SPIE Proceedings.
For today’s advanced reticle production, process bias should be reduced as possible, and be “zero” ideally, because of its negative impacts on CD control and pattern fidelity against minute features. In this paper, blanks with Cr film thinner t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::74c4b896689d8fc23a51ccce7c5710cf
https://doi.org/10.1117/12.467497
https://doi.org/10.1117/12.467497