Sub-10 Nanometer Feature Size in Silicon Using Thermal Scanning Probe Lithography.

Autor: Ryu Cho YK; IBM Research Zurich , Säumerstrasse 4, 8803 Rüschlikon, Switzerland., Rawlings CD; IBM Research Zurich , Säumerstrasse 4, 8803 Rüschlikon, Switzerland.; SwissLitho AG , Technoparkstrasse 1, 8005 Zurich, Switzerland., Wolf H; IBM Research Zurich , Säumerstrasse 4, 8803 Rüschlikon, Switzerland., Spieser M; SwissLitho AG , Technoparkstrasse 1, 8005 Zurich, Switzerland., Bisig S; SwissLitho AG , Technoparkstrasse 1, 8005 Zurich, Switzerland., Reidt S; IBM Research Zurich , Säumerstrasse 4, 8803 Rüschlikon, Switzerland., Sousa M; IBM Research Zurich , Säumerstrasse 4, 8803 Rüschlikon, Switzerland., Khanal SR; University of Pittsburgh , Pittsburgh, Pennsylvania 15261, United States., Jacobs TDB; University of Pittsburgh , Pittsburgh, Pennsylvania 15261, United States., Knoll AW; IBM Research Zurich , Säumerstrasse 4, 8803 Rüschlikon, Switzerland.

Publikováno v: ACS nano [ACS Nano] 2017 Dec 26; Vol. 11 (12), pp. 11890-11897. Date of Electronic Publication: 2017 Nov 01.