Zobrazeno 1 - 10
of 100
pro vyhledávání: '"Ryoung-han Kim"'
Autor:
Ling Ee Tan, Werner Gillijns, Jae Uk Lee, Dongbo Xu, Jeroen van de Kerkhove, Vicky Philipsen, Ryoung-Han Kim
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bba5c57d9fa7328777dde5426a4bd69a
https://doi.org/10.1117/12.2658344
https://doi.org/10.1117/12.2658344
Publikováno v:
DTCO and Computational Patterning II.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64e07d858b4ead55a5928baee325a159
https://doi.org/10.1117/12.2658866
https://doi.org/10.1117/12.2658866
Autor:
Werner Gillijns, Jae-Uk Lee, Ryan Ryoung han Kim, Chih-I Wei, Xima Zhang, Azat Latypov, Germain Fenger, John Sturtevant
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c1b4b09fe6a0ae94a8ad5b139fb1242f
https://doi.org/10.1117/12.2658260
https://doi.org/10.1117/12.2658260
Autor:
Ana-Maria Armeanu, Evgeny Malankin, Neal Lafferty, Chih-I Wei, Monica Sears, Germain Fenger, Xima Zhang, Werner Gillijns, Darko Trivkovic, Ryan Ryoung-Han Kim, Jeonghoon Lee
Publikováno v:
DTCO and Computational Patterning II.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::26bcdac1d8e4e6ad2b2124783443191d
https://doi.org/10.1117/12.2660413
https://doi.org/10.1117/12.2660413
Autor:
Jeonghoon Lee, Sandip Halder, Van Tuong Pham, Roberto Fallica, Seonggil Heo, Kaushik Sah, Hyo Seon Suh, Victor Blanco, Werner Gillijns, Andrew Cross, Ethan Maguire, Ana-Maria Armeanu, Vladislav Liubich, Evgeny Malankin, Xima Zhang, Monica Kempsell Sears, Neal Lafferty, Germain Fenger, Chih-I Wei, Ryoung Han Kim
Publikováno v:
DTCO and Computational Patterning II.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::deb0fc8e40c0cbcd660b69e296139529
https://doi.org/10.1117/12.2660763
https://doi.org/10.1117/12.2660763
Autor:
Dongbo Xu, Werner Gillijns, Ling Ee Tan, David Rio, Max Delorme, Vicky Philipsen, Ryoung-han Kim
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 21
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5f306c3137bb27d672b6c2fcdf14e2ba
https://doi.org/10.1117/1.jmm.21.4.043202
https://doi.org/10.1117/1.jmm.21.4.043202
Publikováno v:
DTCO and Computational Patterning.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2108a37dce962c311d45445e2d21a8ad
https://doi.org/10.1117/12.2617415
https://doi.org/10.1117/12.2617415
Autor:
Syed Muhammad Yasser Sherazi, Yihan Chang, Youssef Drissi, Bilal Chehab, Jae Uk Lee, Victor Vega Gonzalez, Ryan Ryoung Han Kim
Publikováno v:
DTCO and Computational Patterning.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4ee9de2f91fdeb7ea2cf5f95ec5e166a
https://doi.org/10.1117/12.2615311
https://doi.org/10.1117/12.2615311
Publikováno v:
Optical and EUV Nanolithography XXXV.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6084ab7c3450df7e210464900098fce9
https://doi.org/10.1117/12.2614197
https://doi.org/10.1117/12.2614197
Autor:
Ling Ee Tan, Werner Gillijns, Jae Uk Lee, Dongbo Xu, Jeroen van de Kerkhove, Vicky Philipsen, Ryoung-Han Kim
Publikováno v:
Optical and EUV Nanolithography XXXV.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2516c9156f38f805d088c81c8f058f88
https://doi.org/10.1117/12.2614000
https://doi.org/10.1117/12.2614000