Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Ryotaro Hanawa"'
Autor:
S. Yamamoto, Cécile Gourgon, M. Akita, S. Tedesco, Masumi Suetsugu, J. Saint-Pol, Ryotaro Hanawa, S. Landis
Publikováno v:
Microelectronic Engineering. :274-282
Starting from the Sumitomo commercial platform NEB-33 resist, three new experimental negative tone chemical amplified resist (CAR) formulations have been developed, to push resolution below 40 nm in direct electron beam lithography. PEB temperatures
Publikováno v:
Journal of Photopolymer Science and Technology. 15:619-624
Lithographic performances of 157nm resists prepared by partially protected NBHFAMOM polymer were compared by using different size of anion of TPS PAG. Vacuum ultra violet spectroscopy measurement, discrimination curve measurements by 157nm open flame
Publikováno v:
Photochemistry and Photobiology. 52:307-313
— Arachidic acid monolayers containing 5,6,5′,6′-dibenzo-I,I-diethyl-2,2′-cyanine chloride were prepared by the spreading method and deposited on the SnO2 surface using the Langmuir-Blodgett technique. The SnO2 : dye assembly prepared in this
Publikováno v:
Advances in Resist Technology and Processing XX.
Cyclopolymerization methodology is unique because it uses a standard free radical polymerization that is free from the use of metal catalyzed chemistry while it still can provide the main chain cyclic structure. The feasibility and applicability have
Autor:
Cécile Gourgon, A. Andrei, Masumi Suetsugu, Murielle Charpin, S. Tedesco, Ryotaro Hanawa, Tadashi Kusumoto, Daniel Henry, Yves Laplanche, Laurent Pain, H. Yokoyama
Publikováno v:
SPIE Proceedings.
In this study, it is investigated how chemical modifications of a given resist platform can induce improvements in e-beam lithographic performances. Molecular weight (Mw) as well as photo-acid generator (PAG) modifications will act as fine tuners for
Publikováno v:
SPIE Proceedings.
A mixture of high Mw fractionated novolac resin and 2EAdMA (2-ethyl-2-adamantyle methacrylate)/HST (hydroxy styrene) copolymer brought about high resolution almost comparative to simple 2EAdMA/HST copolymer. Dry etching resistance was higher than 2EA
Autor:
Yasunori Uetani, Isao Yoshida, Kazuhiko Hashimoto, Yoshiko Miya, Ryotaro Hanawa, Mikio Takigawa
Publikováno v:
SPIE Proceedings.
We reported the novel copolymer system containing fluorine atom with hydroxystyrene (HST) and 3-(perfluoro-3- methylbutyl)-2-hydroxypropyl methacrylate (MBHPMA). Using the copolymer, melamine crosslinker and PAG, negative resist was formulated. Trans
Autor:
Tadashi Kusumoto, Bernard Dalzotto, Gilles L. Fanget, Masumi Suetsugu, S. Tedesco, Laurent Pain, M. Ribeiro, B. Scarfogliere, Cécile Gourgon, K. Patterson, Ryotaro Hanawa
Publikováno v:
SPIE Proceedings.
Chemical Amplification Resists (CAR) are now widely used in optical lithography since the introduction of the deep UV era. One advantage of the CARs is also their full compatibility with electron beam writing. This paper is focused on the development
Publikováno v:
Advances in Resist Technology and Processing X.
PACs which have a defined number of DNQs and -OH groups were synthesized with high yield by the selective esterification method, and the relationship between number and orientation of DNQs, and lithographic performances and dissolution properties, we
Publikováno v:
SPIE Proceedings.
Steric hindrance on a ballast molecule causes selective esterification of -OH groups and provides novel di-esterified PACs having -OH group(s) with high selectivity. These novel PACs give photoresists higher sensitivities, (gamma) -values and resolut