Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Ryoji Okuda"'
Publikováno v:
International Symposium on Microelectronics. 2017:000029-000035
We investigated the effects of photosensitive system (positive and negative) and polymer structures on Cu migration under bias HAST test. The HAST condition is 130C for 85% RH. Bias condition is 2MV/m. We found that there is polyimide structure shows
Publikováno v:
Journal of Photopolymer Science and Technology. 30:181-185
Publikováno v:
2018 International Conference on Electronics Packaging and iMAPS All Asia Conference (ICEP-IAAC).
Low temperature curable photosensitive polyimide having extremely good Cu migration resistance were developed by examining the polyimide structure, photo chemistry, cross-linkers. We observed the polyimide structure affected the Cu migration resistan
Publikováno v:
2018 Pan Pacific Microelectronics Symposium (Pan Pacific).
Positive tone photosensitive polyimide having low temperature curability and extremely good Cu migration was developed. In order to develop, we investigated the effect of polyimide structure and photosensitive method. We observed the polyimide struct
Publikováno v:
Journal of Photopolymer Science and Technology. 28:73-77
Autor:
Hashimoto Keika, Yu Shoji, Takenori Fujiwara, Yutaro Koyama, Yuki Masuda, Ryoji Okuda, Kimio Isobe, Hitoshi Araki, Masao Tomikawa
Publikováno v:
2017 IEEE 19th Electronics Packaging Technology Conference (EPTC).
In this study, we have developed low-temperature curable positive-tone photo-definable dielectric materials with high elongation property for redistribution layers (RDLs). This high elongation concept introduces a flexible molecular skeleton in the b
Autor:
Hitoshi Araki, Yutaro Koyama, Yuki Masuda, Masao Tomikawa, Ryoji Okuda, Yu Shoji, Kimio Isobe, Hashimoto Keika
Publikováno v:
2017 IEEE CPMT Symposium Japan (ICSJ).
Fan-Out Wafer Level Packages (FOWLPs) and Fan-Out Panel Level Packages (FOPLPs) have been proposed for promising candidates of the advanced packages for multifunctional LSI with many I/O (input/output). FOPLP is expected to reduce the cost of FOWLP b
Publikováno v:
2016 IEEE 66th Electronic Components and Technology Conference (ECTC).
Novel Low-temperature curable positive-tone photosensitive polyimides (posi-PSPIs) with high elongationhave been developed as dielectric layers for copperredistribution layers (RDLs). The posi-PSPIs show lowtemperature curable nature, strong adhesion
Publikováno v:
Journal of Photopolymer Science and Technology. 23:775-779
Publikováno v:
Journal of Photopolymer Science and Technology. 17:207-213
We developed novel positive-tone photosensitive polyimide coatings for insulation layers in organic light emitting diode (OLED) displays. We evaluated the features of the novel coatings in comparison to other candidate polymers including novolak resi