Zobrazeno 1 - 10
of 182
pro vyhledávání: '"Ryo Ono"'
Publikováno v:
Nihon Kikai Gakkai ronbunshu, Vol 83, Iss 850, Pp 17-00049-17-00049 (2017)
This study addressed a deflagration-to-detonation transition (DDT) process after interaction of the convex flame with a planar shock wave. High-speedvideo cameras and schlieren optical technique were utilized to observe the DDT as well as shock-flame
Externí odkaz:
https://doaj.org/article/c6d0f650550444ed80198adba52a4aad
Publikováno v:
IEEE Transactions on Plasma Science. 50:5051-5059
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7ee5930bd52f6e18e369f4cdfa06dc0
https://doi.org/10.1109/tps.2022.3221474
https://doi.org/10.1109/tps.2022.3221474
Autor:
Masamoto FUKAWA, Xiaoqi DENG, Shinya IMAI, Taiga HORIGUCHI, Ryo ONO, Ikumi RACHI, Sihan A, Kazuma SHINOMURA, Shunsuke NIWA, Takeshi KUDO, Hiroyuki ITO, Hitoshi WAKABAYASHI, Yoshihiro MIYAKE, Atsushi HORI
Publikováno v:
IEICE Transactions on Information and Systems. :1624-1628
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5345e80c3e3a17b8d0ca1fcc50644661
https://doi.org/10.1587/transinf.2022edl8026
https://doi.org/10.1587/transinf.2022edl8026
Publikováno v:
2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aa6f95ce47e9f65756492ce6acf48c56
https://doi.org/10.1109/edtm55494.2023.10103043
https://doi.org/10.1109/edtm55494.2023.10103043
Autor:
Ryo Ono, Shinya Imai, Takamasa Kawanago, Iriya Muneta, Kuniyuki Kakushima, Kazuo Tsutsui, Tetsuya Tatsumi, Shigetaka Tomiya, Hitoshi Wakabayashi
Publikováno v:
2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::69b5b6eed801e575c96dc8766cd60cac
https://doi.org/10.1109/edtm55494.2023.10103089
https://doi.org/10.1109/edtm55494.2023.10103089
Autor:
Ryo ONO
Publikováno v:
The Journal of The Institute of Electrical Engineers of Japan. 142:701-703
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b670a353e7b6177265fc3b930560d5bd
https://doi.org/10.1541/ieejjournal.142.701
https://doi.org/10.1541/ieejjournal.142.701
Autor:
Takaomi Hayashi, Naoya Aisu, Ryo Ono, Ryuji Kajitani, Yoshiko Matsumoto, Hideki Nagano, Akira Komono, Gunpei Yoshimatsu, Yoichiro Yoshida, Suguru Hasegawa
Publikováno v:
Nippon Daicho Komonbyo Gakkai Zasshi. 75:1-7
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e3154c7368ea02655b27fce29c344a5
https://doi.org/10.3862/jcoloproctology.75.1
https://doi.org/10.3862/jcoloproctology.75.1
Publikováno v:
Journal of Physics D: Applied Physics. 56:185201
Limited research has been conducted on the formation mechanism of chemically active species in streamer discharges with respect to the oxygen concentration, which is critical to various applications such as ozone generation, air purification, and pla
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f939f5470ca9a1f15cf9b93e6ffe168
https://doi.org/10.1088/1361-6463/acc18f
https://doi.org/10.1088/1361-6463/acc18f
Publikováno v:
Plasma Sources Science and Technology. 32:035004
Reactive species play important roles in plasma treatments of surfaces, including polymers, metals, water, and living tissues. To elucidate the surface reaction mechanism, it is crucial to measure the effect of each type of reactive species on the su
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e7ee37a470f8abc33d111eb466c60d00
https://doi.org/10.1088/1361-6595/acc131
https://doi.org/10.1088/1361-6595/acc131
Autor:
Masaki Otomo, Masaya Hamada, Ryo Ono, Iriya Muneta, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi
Publikováno v:
Japanese Journal of Applied Physics. 62:SC1015
Zirconium disulfide (ZrS2)—an attractive next-generation channel material because of its high mobility—is stabilized in the air by a zirconium dioxide (ZrO2) film which functions as a high-k film in MISFET. We fabricated high-k/PVD-ZrS2 stacks wi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::98a421e865a4810bc10ccacaa61e7cc4
https://doi.org/10.35848/1347-4065/aca7cf
https://doi.org/10.35848/1347-4065/aca7cf