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pro vyhledávání: '"Ruxandra Mustata"'
Autor:
Amine Lakcher, Gunwoong Lee, Geert Vinken, Ahmed Zayed, Ruxandra Mustata, Jay Jung, Beomki Shin, Arno van den Brink, Mohamed El Kodadi, Paul Böcker, Soo Kyung Lee, Jeongsu Park, Gratiela Isai, Taeddy Kim, Jan-Pieter van Delft, Sangjun Han, Yong-Sik Shin, Chanha Park, Jennifer Shumway
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
The market transition from 2D to 3D-NAND in recent years requires strict focus control and monitoring solutions. ASML’s μDBF targets (micro Diffraction Based Focus) enable on-product focus measurement which can be used to optimize scanner correcti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7fcb522f2f82a1be31985ac620d89729
https://doi.org/10.1117/12.2552930
https://doi.org/10.1117/12.2552930
