Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Rusty Carter"'
Autor:
Chris Progler, Young-Mog Ham, Wei Wu, Mark Smith, Lloyd C. Litt, Mike Cangemi, Rusty Carter, Rand Cottle, Bernie Roman, Jonathan L. Cobb, Kevin Lucas, Bryan S. Kasprowicz, Will Conley, Marc Cangemi, Matt Lassiter
Publikováno v:
Optical Microlithography XVIII.
The lithography prognosticator of the early 1980"s declared the end of optics for sub-0.5μm imaging. However, significant improvements in optics, photoresist and mask technology continued through the mercury lamp lines (436, 405 & 365nm) and into la
Autor:
Franklin D. Kalk, Susan S. MacDonald, Rusty Carter, Curt Jackson, Robert Kiefer, Joe Perez, Kirk J. Strozewski
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
Reticle costs are increasing as users tighten specifications to accommodate the shrinking process windows in advanced semiconductor lithography. Tighter specs often drive the use of e-beam based mask processes, which produce better mask pattern acuit