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pro vyhledávání: '"Rupp JL"'
Akademický článek
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Autor:
Bruce MA; Montana State University, Bozeman, MT, USA.; Kansas State University, Manhattan, KS, USA., Shoup Rupp JL; Montana State University, Bozeman, MT, USA. jessica.rupp@montana.edu.; Kansas State University, Manhattan, KS, USA. jessica.rupp@montana.edu.
Publikováno v:
Methods in molecular biology (Clifton, N.J.) [Methods Mol Biol] 2019; Vol. 1864, pp. 203-223.
Autor:
Schweiger S; Electrochemical Materials, ETH Zürich, HPP P 21, Honggerbergring 64, 8093, Zürich, Switzerland., Pfenninger R; Electrochemical Materials, ETH Zürich, HPP P 21, Honggerbergring 64, 8093, Zürich, Switzerland., Bowman WJ; Electrochemical Materials, ETH Zürich, HPP P 21, Honggerbergring 64, 8093, Zürich, Switzerland.; School for Engineering of Matter, Transport and Energy, Arizona State University, Tempe, AZ, 85287, USA.; Laboratory for Electrochemical Interfaces, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA., Aschauer U; Materials Theory, ETH Zürich, 8093, Zürich, Switzerland.; Department of Chemistry and Biochemistry, University of Bern, 3012, Bern, Switzerland., Rupp JL; Electrochemical Materials, ETH Zürich, HPP P 21, Honggerbergring 64, 8093, Zürich, Switzerland.; Electrochemical Materials, Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA.
Publikováno v:
Advanced materials (Deerfield Beach, Fla.) [Adv Mater] 2017 Apr; Vol. 29 (15). Date of Electronic Publication: 2017 Feb 13.
Autor:
Erdem D; Laboratory for Multifunctional Materials, Department of Materials, ETH Zurich , Vladimir-Prelog-Weg 5, 8093, Zurich, Switzerland., Bingham NS, Heiligtag FJ; Laboratory for Multifunctional Materials, Department of Materials, ETH Zurich , Vladimir-Prelog-Weg 5, 8093, Zurich, Switzerland., Pilet N, Warnicke P, Vaz CA, Shi Y, Buzzi M, Rupp JL, Heyderman LJ, Niederberger M; Laboratory for Multifunctional Materials, Department of Materials, ETH Zurich , Vladimir-Prelog-Weg 5, 8093, Zurich, Switzerland.
Publikováno v:
ACS nano [ACS Nano] 2016 Nov 22; Vol. 10 (11), pp. 9840-9851. Date of Electronic Publication: 2016 Oct 11.
Autor:
Hänsel C; ETH Zurich, Department of Materials, CH-8093 Zurich, Switzerland. semih.afyon@alumni.ethz.ch jennifer.rupp@mat.ethz.ch., Afyon S; ETH Zurich, Department of Materials, CH-8093 Zurich, Switzerland. semih.afyon@alumni.ethz.ch jennifer.rupp@mat.ethz.ch., Rupp JL; ETH Zurich, Department of Materials, CH-8093 Zurich, Switzerland. semih.afyon@alumni.ethz.ch jennifer.rupp@mat.ethz.ch.
Publikováno v:
Nanoscale [Nanoscale] 2016 Nov 03; Vol. 8 (43), pp. 18412-18420.
Autor:
Rawlence M; Lab Thin Films & Photovoltaics, Empa Swiss Fed Labs Material Science & Technology, CH-8600 Dübendorf, Switzerland., Garbayo I, Buecheler S, Rupp JL
Publikováno v:
Nanoscale [Nanoscale] 2016 Aug 21; Vol. 8 (31), pp. 14746-53. Date of Electronic Publication: 2016 Jul 25.
Autor:
Yang N, Shi Y; Electrochemical Materials, ETH Zurich , Zurich, 8093, Switzerland., Schweiger S; Electrochemical Materials, ETH Zurich , Zurich, 8093, Switzerland., Strelcov E; Center for Nanophase Materials Sciences, Oak Ridge National Laboratory , Oak Ridge, Tennessee 37831, United States., Belianinov A; Center for Nanophase Materials Sciences, Oak Ridge National Laboratory , Oak Ridge, Tennessee 37831, United States., Foglietti V, Orgiani P; National Research Council CNR-SPIN, University of Salerno , Fisciano, Salerno I-84084, Italy., Balestrino G, Kalinin SV; Center for Nanophase Materials Sciences, Oak Ridge National Laboratory , Oak Ridge, Tennessee 37831, United States., Rupp JL; Electrochemical Materials, ETH Zurich , Zurich, 8093, Switzerland., Aruta C
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2016 Jun 15; Vol. 8 (23), pp. 14613-21. Date of Electronic Publication: 2016 Jun 06.
Autor:
Imtiaz Q; Laboratory of Energy Science and Engineering, Department of Mechanical and Process Engineering, ETH Zürich, Leonhardstrasse 21, 8092 Zürich, Switzerland. muelchri@ethz.ch., Abdala PM; Laboratory of Energy Science and Engineering, Department of Mechanical and Process Engineering, ETH Zürich, Leonhardstrasse 21, 8092 Zürich, Switzerland. muelchri@ethz.ch., Kierzkowska AM; Laboratory of Energy Science and Engineering, Department of Mechanical and Process Engineering, ETH Zürich, Leonhardstrasse 21, 8092 Zürich, Switzerland. muelchri@ethz.ch., van Beek W; Swiss Norwegian Beamlines, European Synchrotron Radiation Facility (ESRF), Grenoble, France., Schweiger S; Electrochemical Materials, Department of Materials, ETH Zürich, Hönggerbergring 64, 8093 Zürich, Switzerland., Rupp JL; Electrochemical Materials, Department of Materials, ETH Zürich, Hönggerbergring 64, 8093 Zürich, Switzerland., Müller CR; Laboratory of Energy Science and Engineering, Department of Mechanical and Process Engineering, ETH Zürich, Leonhardstrasse 21, 8092 Zürich, Switzerland. muelchri@ethz.ch.
Publikováno v:
Physical chemistry chemical physics : PCCP [Phys Chem Chem Phys] 2016 Apr 28; Vol. 18 (17), pp. 12278-88.
Autor:
Kubicek M; Electrochemical Materials, ETH Zurich , Hönggerbergring 64, 8093 Zurich, Switzerland., Schmitt R; Electrochemical Materials, ETH Zurich , Hönggerbergring 64, 8093 Zurich, Switzerland., Messerschmitt F; Electrochemical Materials, ETH Zurich , Hönggerbergring 64, 8093 Zurich, Switzerland., Rupp JL; Electrochemical Materials, ETH Zurich , Hönggerbergring 64, 8093 Zurich, Switzerland.
Publikováno v:
ACS nano [ACS Nano] 2015 Nov 24; Vol. 9 (11), pp. 10737-48. Date of Electronic Publication: 2015 Oct 16.
Autor:
Stender D; Paul Scherrer Institut, Research Department General Energy, 5232 Villigen, Switzerland. thomas.lippert@psi.ch., Frison R, Conder K, Rupp JL, Scherrer B, Martynczuk JM, Gauckler LJ, Schneider CW, Lippert T, Wokaun A
Publikováno v:
Physical chemistry chemical physics : PCCP [Phys Chem Chem Phys] 2015 Jul 28; Vol. 17 (28), pp. 18613-20.