Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Ruixuan Wu"'
Autor:
Yuan Ma, Changbo Jiang, Shanshan Li, Yizhuang Liu, Xiaofeng Wen, Yuannan Long, Shuai Yuan, Yuantai Kang, Yongjie Wang, Ruixuan Wu
Publikováno v:
Frontiers in Ecology and Evolution, Vol 11 (2023)
Coral reefs are ecosystems that are highly vulnerable to external environmental impacts, including changes associated with ocean acidification and global warming. Assessing the vulnerability of coral reef growth environments over large areas of the s
Externí odkaz:
https://doaj.org/article/a9bb910164014fca948d2a72602de33e
Publikováno v:
Brain Sciences, Vol 13, Iss 8, p 1222 (2023)
Significant advances in sensor technology and virtual reality (VR) offer new possibilities for early and effective detection of mild cognitive impairment (MCI), and this wealth of data can improve the early detection and monitoring of patients. In th
Externí odkaz:
https://doaj.org/article/cb51a3d3447c4773acd5e8c2fa472471
Autor:
Shanshan Li, Changbo Jiang, Yuan Ma, Yuannan Long, Ruixuan Wu, Qingxiong Zhu, Donglin Li, Chuannan Li, Zihao Ning
Publikováno v:
Atmosphere, Vol 13, Iss 10, p 1735 (2022)
Precipitation data from ground-based observatories in the Dongting Lake basin are often missing, resulting in large errors in surface precipitation data obtained by interpolation, which affects the accuracy of hydro-meteorological studies. Integrated
Externí odkaz:
https://doaj.org/article/b60435fe652c46729270d57b41dcad31
Autor:
Jiali Chai, Ruixuan Wu, Aoyu Li, Chen Xue, Yan Qiang, Juanjuan Zhao, Qinghua Zhao, Qianqian Yang
Publikováno v:
Computers in biology and medicine. 152
Subtle changes in fine motor control and quantitative electroencephalography (qEEG) in patients with mild cognitive impairment (MCI) are important in screening for early dementia in primary care populations. In this study, an automated, non-invasive
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2d8ac973fda370c1814d73b848143b80
https://pubmed.ncbi.nlm.nih.gov/36566627
https://pubmed.ncbi.nlm.nih.gov/36566627
Publikováno v:
Proceedings of the 2022 2nd International Conference on Economic Development and Business Culture (ICEDBC 2022) ISBN: 9789464630350
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6a4dbeae437386a5cb0a42129ea1d88f
https://doi.org/10.2991/978-94-6463-036-7_70
https://doi.org/10.2991/978-94-6463-036-7_70
Autor:
Kaixuan Tong, Hanying Mao, Ruixuan Wu, Jiankang Zhong, Hanling Mao, Zhenfeng Huang, Xinxin Li
Publikováno v:
Journal of Vibration and Control. :107754632311546
The condition monitoring system of the hydropower generator unit (HGU) contains a vast amount of monitoring data related to equipment performance. It is challenging to reveal the HGU performance change law from these data. This paper constructed a co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::427743c3d26a773c238c8656415130b9
https://doi.org/10.1177/10775463231154665
https://doi.org/10.1177/10775463231154665
Publikováno v:
Optics express. 29(18)
Mask blank defect is one of the most important factors that degrades the image quality of extreme ultraviolet (EUV) lithography system, and further leads to a yield lose. In order to compensate the amplitude and phase distortions caused by the EUV ma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c363195252b08236b6680b86c8dbbc5d
https://pubmed.ncbi.nlm.nih.gov/34615008
https://pubmed.ncbi.nlm.nih.gov/34615008
Publikováno v:
Wear. :204219
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::323075e4857e891a355dbb2b2bfb0af6
https://doi.org/10.1016/j.wear.2021.204219
https://doi.org/10.1016/j.wear.2021.204219
Publikováno v:
Extreme Ultraviolet Lithography 2020.
Features in forbidden pitch have limited exposure latitude and depth of focus in lithography exposure. This paper provides an analysis of forbidden pitch in extreme ultraviolet lithography (EUVL) from the perspective of rigorous simulation and source
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::26c13b214b657447a27d6989a535bf54
https://doi.org/10.1117/12.2573145
https://doi.org/10.1117/12.2573145
Autor:
Rui Chen, Yajuan Su, Ruixuan Wu, Ying Chen, Lisong Dong, Yayi Wei, Le Ma, Yibo Lin, Tianyang Gai
Publikováno v:
Optics express. 28(12)
Extreme ultraviolet (EUV) lithography mask defects may cause severe reflectivity deformation and phase shift in advanced nodes, especially like multilayer defects. Geometric parameter characterization is essential for mask defect compensation or repa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f797f536717b243730bfaa7d175d4bdd
https://pubmed.ncbi.nlm.nih.gov/32680047
https://pubmed.ncbi.nlm.nih.gov/32680047