Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Rudy Mui"'
Publikováno v:
Opflow. 40:20-23
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b7b12d846d08b54a6eae00656ec009d
https://doi.org/10.5991/opf.2014.40.0003
https://doi.org/10.5991/opf.2014.40.0003
Publikováno v:
AIP Conference Proceedings.
The capabilities of a trace contamination analyzer are discussed and demonstrated. This analytical tool utilizes an electrospray, time‐of‐flight mass spectrometer (ES‐TOF‐MS) for fully automated on‐line monitoring of wafer cleaning solution
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64dbf38087e7d9f963fc0f7aaea4b7ac
https://doi.org/10.1063/1.1622486
https://doi.org/10.1063/1.1622486
Automated, On-Line, Trace Contamination and Chemical Species Analysis For the Semiconductor Industry
Autor:
Ye Han, Michael West, Robert McDonald, Jason Wang, June Wang, Larry N. Stewart, Rudy Mui, Bob Ormond, Skip Kingston
Publikováno v:
AIP Conference Proceedings.
A new method and apparatus are described for on‐line mass spectrometry that enables real‐time, automated, trace contamination and chemical species analyses focused on semiconductor manufacturing application. The scaleable ion source produces not
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::15c760c043c09cf0ca5abaaab29907ed
https://doi.org/10.1063/1.1622533
https://doi.org/10.1063/1.1622533
Publikováno v:
AIP Conference Proceedings.
The implementation of copper processing in semiconductor manufacturing has resulted in major process development and manufacturing challenges. A fundamental understanding of the copper plating processes used in manufacturing has been limited by the l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c5fa9dc55a9dc956ab40d367f0da1509
https://doi.org/10.1063/1.1622519
https://doi.org/10.1063/1.1622519