Zobrazeno 1 - 8 of 8 pro vyhledávání: '"Rudolf R. Burke"'
1
Infrared absorption of the products formed in distributed electron cyclotron resonance plasmas of hexamethyldisiloxane and tetraethoxysilane
Autor: A Boulanger, Rudolf R. Burke, P. Raynaud, G Balmer, Y. Segui
Publikováno v: Journal of Physics D: Applied Physics. 30:L23-L27
As soon as power is applied, the distributed electron cyclotron resonance (DECR) plasma rapidly dissociates the hexamethyldisiloxane (HMDS) and tetraethoxysilane (TEOS) parent molecules. At low power, the daughter molecules methane, acetylene, and et
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::281200d9a88b56b668cede98b895d547
https://doi.org/10.1088/0022-3727/30/8/001
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2
Infrared absorption analysis of organosilicon/oxygen plasmas in a microwave multipolar plasma excited by distributed electron cyclotron resonance
Autor: Rudolf R. Burke, C. Marlière, P. Raynaud, Y. Segui, D. Berthomieux, Jean Durand
Publikováno v: Journal de Physique IV Proceedings
Journal de Physique IV Proceedings, EDP Sciences, 1998, 08 (PR7), pp.Pr7-265-Pr7-272. ⟨10.1051/jp4:1998722⟩
La dissociation de 4 groupes de monomeres organosilicies (tels que l'hexamethydisiloxane, le tetraethoxysilane, le tetramethylsilane ou encore le tetramethoxysilane) dans un reacteur PMM RCER est analysee par spectroscopie d'absorption infrouge. Les
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e70f382505bbdace00aae774b2ff72bc
https://hal.umontpellier.fr/hal-01737477
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3
Applications of Distributed Electron Cyclotron Resonance (DECR) to Plasma-Surface Interaction
Autor: Rudolf R. Burke
Publikováno v: Microwave Discharges ISBN: 9781489911322
Surface treatment by plasmas usually imposes two requirements: uniformity of the treatment and intensity of the ion bombardement at the surface. As a result, physicists and chemists continue to search for dense and homogeneous plasmas, that furthermo
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::58fe05f30aca06f303509b0943cdcfd3
https://doi.org/10.1007/978-1-4899-1130-8_32
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4
Distributed electron cyclotron resonance in silicon processing: Epitaxy and etching
Autor: L. Vallier, Jacques Pelletier, Claude Pomot, Rudolf R. Burke
Publikováno v: J. Vac. Sci. Technol
J. Vac. Sci. Technol, 1990, A8(3), pp.2931
Journal of Vacuum Science and Technology
Journal of Vacuum Science and Technology, 1990, A8(3), pp.2931
The microwave multipolar plasma (MMP) is confined by a multipolar magnetic field and excited by a 2.45 GHz microwave electric field. The distributed electron cyclotron resonance (DECR) excitation uses the confinement magnets to obtain the resonant ma
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7750ea3c093636fb5cb17cce942ca802
https://hal.archives-ouvertes.fr/hal-00282417
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5
Microwave multipolar plasma for etching and deposition
Autor: Rudolf R. Burke, Claude Pomot
Publikováno v: Applied Surface Science. 36:267-277
Microwave multipolar plasmas (MMP) are plasmas confined by a multipolar magnetic field and excited by 2.45 GHz microwaves. Two main features distinguish MMP's from conventional plasmas: the plasma excitation is disconnected from the plasma-surface in
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5b790a479c04105c0243f4217e434dd6
https://doi.org/10.1016/0169-4332(89)90922-7
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8
Periodical
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