Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Rudolf Moellers"'
Autor:
Ian S. Gilmore, Peter S. Marshall, Melissa K. Passarelli, Alexander Makarov, Morgan R. Alexander, Dmitry Grinfeld, Stevan Horning, Rudolf Moellers, Colin T. Dollery, Andrew West, Rasmus Havelund, Ewald Niehuis, Carla F. Newman, Alexander Pirkl, Felix Kollmer, Henrik Arlinghaus
Publikováno v:
Nature Methods. 14:1175-1183
© 2017 Nature America, Inc., part of Springer Nature. All rights reserved. We report the development of a 3D OrbiSIMS instrument for label-free biomedical imaging. It combines the high spatial resolution of secondary ion mass spectrometry (SIMS; und
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8678987b5c985672e48ae22c20695052
https://doi.org/10.1038/nmeth.4504
https://doi.org/10.1038/nmeth.4504
Autor:
Felix Kollmer, Henrik Arlinghaus, Ewald Niehuis, Sven Kayser, Alexander Pirkl, Nathan Havercroft, Rudolf Moellers
Publikováno v:
Microscopy and Microanalysis. 26:76-77
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a46f05bd02288050b6ec3077d09cae5
https://doi.org/10.1017/s143192762001329x
https://doi.org/10.1017/s143192762001329x
Autor:
Anja Henss, Ewald Niehuis, Wolfgang Paul, Nathan Havercroft, Felix Kollmer, Rudolf Moellers, Henrik Arlinghaus
Publikováno v:
Microscopy and Microanalysis. 24:1026-1027
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a38ac7ea82e5f9b680d60adf4f7cd056
https://doi.org/10.1017/s1431927618005627
https://doi.org/10.1017/s1431927618005627
Autor:
Nicholas Winograd, Ian S. Gilmore, D. Rading, Rasmus Havelund, Martin P. Seah, Ewald Niehuis, Dan Mao, Steve J. Spencer, Rudolf Moellers, Takuya Miyayama, Alexander G. Shard
Publikováno v:
Analytical Chemistry. 84:7865-7873
The depth profiling of organic materials with argon cluster ion sputtering has recently become widely available with several manufacturers of surface analytical instrumentation producing sources suitable for surface analysis. In this work, we assess
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0fcdbca4cb85cd64d9f65dac9d79b46f
https://doi.org/10.1021/ac301567t
https://doi.org/10.1021/ac301567t
Publikováno v:
Surface and Interface Analysis. 45:171-174
Dual beam depth profiling was applied in order to investigate the possibilities and limitations of C60 and Ar cluster ion sputtering for depth profiling of polymer materials. Stability and intensity of characteristic high mass molecular ion signals a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5999d4a42285bdcfe255c1e7f001b102
https://doi.org/10.1002/sia.5122
https://doi.org/10.1002/sia.5122
Autor:
Morgan R. Alexander, Ewald Niehuis, Ian S. Gilmore, Rudolf Moellers, Rasmus Havelund, Alan M. Race, Alexander G. Shard, Stevan Horning, Colin T. Dollery, Melissa K. Passarelli, Alexander Makarov, Felix Kollmer, Carla F. Newman, Alexander Pirkl, Peter S. Marshall, Paulina D. Rakowska, Henrik Arlinghaus, Andrew West
Publikováno v:
Microscopy and Microanalysis. 22:340-341
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d8231e5acf550612a7e0fb57df6d9c01
https://doi.org/10.1017/s1431927616002555
https://doi.org/10.1017/s1431927616002555
Autor:
T. Tabarrant, Arnaud Delcorte, Patrick Bertrand, Laurent Houssiau, J. Brison, Ewald Niehuis, Nimer Wehbe, Rudolf Moellers, Taoufiq Mouhib
Publikováno v:
Surface and Interface Analysis. 45:178-180
The performance of Cs+, C60 + and Ar n + (with n ≈ 1700) sputtering ions have been compared for depth profiling multilayer films made from three evaporated phenylalanine layers sandwiched between four thicker evaporated tyrosine layers. Using Cs +,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::203ce0e299666c52d0f9a040997e290e
https://doi.org/10.1002/sia.5121
https://doi.org/10.1002/sia.5121
Publikováno v:
Surface and Interface Analysis. 45:131-133
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df7df33b7347b64d299f52b040aa55c7
https://doi.org/10.1002/sia.4932
https://doi.org/10.1002/sia.4932
Autor:
Ewald Niehuis, Reinhard Kersting, Felix Kollmer, Thomas Grehl, Birgit Hagenhoff, D. Rading, Rudolf Moellers
Publikováno v:
Surface and Interface Analysis. 43:204-206
The emission of Cs + and MCs + ions from various materials like Si, Al, Ti, Fe and Zn under Bi 1 and C 60 cluster bombardment is studied in the TOF-SIMS dual-beam mode with low-energy Cs sputtering. High yield enhancements up to 2000 are observed for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::13f00b94cb437dbc9ce56ce562fc3969
https://doi.org/10.1002/sia.3465
https://doi.org/10.1002/sia.3465
Publikováno v:
Surface and Interface Analysis. 43:198-200
The dual beam mode of depth profiling has been used to investigate the influence of sputter beam energy, angle and sample rotation on the quality of organic depth profiles in a TOF-SIMS instrument. The sample under investigation was a multilayer samp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3d66b10a2bd8d02b3acf060e1508bc4b
https://doi.org/10.1002/sia.3422
https://doi.org/10.1002/sia.3422