Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Ruben Alcala"'
Autor:
Jun Okuno, Tsubasa Yonai, Takafumi Kunihiro, Yusuke Shuto, Ruben Alcala, Maximilian Lederer, Konrad Seidel, Thomas Mikolajick, Uwe Schroeder, Masanori Tsukamoto, Taku Umebayashi
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 11, Pp 43-46 (2023)
We have previously studied fatigue and its recovery phenomenon on 64 kbits hafnium-based one-transistor and one-capacitor (1T1C) ferroelectric random-access memory (FeRAM) with PVD-TiN (30 nm)/ALD- Hf0.5Zr0.5O2 (8 nm)/CVD-TiN (50 nm) capacitors. In t
Externí odkaz:
https://doaj.org/article/6a90b2f69f154a19884fc471060b0b00
Autor:
José P. B. Silva, Ruben Alcala, Uygar E. Avci, Nick Barrett, Laura Bégon-Lours, Mattias Borg, Seungyong Byun, Sou-Chi Chang, Sang-Wook Cheong, Duk-Hyun Choe, Jean Coignus, Veeresh Deshpande, Athanasios Dimoulas, Catherine Dubourdieu, Ignasi Fina, Hiroshi Funakubo, Laurent Grenouillet, Alexei Gruverman, Jinseong Heo, Michael Hoffmann, H. Alex Hsain, Fei-Ting Huang, Cheol Seong Hwang, Jorge Íñiguez, Jacob L. Jones, Ilya V. Karpov, Alfred Kersch, Taegyu Kwon, Suzanne Lancaster, Maximilian Lederer, Younghwan Lee, Patrick D. Lomenzo, Lane W. Martin, Simon Martin, Shinji Migita, Thomas Mikolajick, Beatriz Noheda, Min Hyuk Park, Karin M. Rabe, Sayeef Salahuddin, Florencio Sánchez, Konrad Seidel, Takao Shimizu, Takahisa Shiraishi, Stefan Slesazeck, Akira Toriumi, Hiroshi Uchida, Bertrand Vilquin, Xianghan Xu, Kun Hee Ye, Uwe Schroeder
Publikováno v:
APL Materials, Vol 11, Iss 8, Pp 089201-089201-70 (2023)
Ferroelectric hafnium and zirconium oxides have undergone rapid scientific development over the last decade, pushing them to the forefront of ultralow-power electronic systems. Maximizing the potential application in memory devices or supercapacitors
Externí odkaz:
https://doaj.org/article/bdc8e7ac6d8a4918bcd408390bfda1b5
Autor:
Furqan Mehmood, Ruben Alcala, Pramoda Vishnumurthy, Bohan Xu, Ridham Sachdeva, Thomas Mikolajick, Uwe Schroeder
Publikováno v:
Advanced Materials Interfaces, Vol 10, Iss 8, Pp n/a-n/a (2023)
Abstract Further optimization of a typically reported ferroelectric capacitor comprised of a Hf0.5Zr0.5O2 ferroelectric thin film with TiN electrodes is explored by introducing an additional non‐ferroelectric La2O3 interfacial layer evaluated at di
Externí odkaz:
https://doaj.org/article/5148a129fb114430b3d2705643e768fb
Autor:
Hanan Alexandra Hsain, Younghwan Lee, Suzanne Lancaster, Monica Materano, Ruben Alcala, Bohan Xu, Thomas Mikolajick, Uwe Schroeder, Gregory N. Parsons, Jacob L. Jones
Publikováno v:
ACS applied materialsinterfaces. 14(37)
Hafnia-zirconia (HfO
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ebde40b7cfec213eb7bd36b9599cfc01
https://pubmed.ncbi.nlm.nih.gov/36069477
https://pubmed.ncbi.nlm.nih.gov/36069477
Autor:
Ruben Alcala, Furqan Mehmood, Pramoda Vishnumurthy, Terence Mittmann, Thomas Mikolajick, Uwe Schroeder
Publikováno v:
2022 IEEE International Memory Workshop (IMW).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::42f63d195d53071b53cef5e0c038b9c9
https://doi.org/10.1109/imw52921.2022.9779287
https://doi.org/10.1109/imw52921.2022.9779287
Autor:
Furqan Mehmood, Ruben Alcala, Pramoda Vishnumurthy, Bohan Xu, Ridham Sachdeva, Thomas Mikolajick, Uwe Schroeder
Publikováno v:
Advanced Materials Interfaces. 10:2202151
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::36db5a19dfe9f9dd6132eb321ba1046e
https://doi.org/10.1002/admi.202202151
https://doi.org/10.1002/admi.202202151
Autor:
Patrick D. Lomenzo, Ruben Alcala, Monica Materano, Claudia Richter, Thomas Mikolajick, Uwe Schroeder
Publikováno v:
ECS Meeting Abstracts. :1135-1135
The limits of integrating ferroelectric materials on commercial semiconductor chips were demolished the moment ferroelectricity in hafnia and zirconia films was reported in 2011. This breakthrough moment in the history of ferroelectric materials was
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::73e16cef8f69285a2102ec2417974922
https://doi.org/10.1149/ma2022-02311135mtgabs
https://doi.org/10.1149/ma2022-02311135mtgabs
Autor:
Songrui Li, Thomas Mikolajick, Uwe Schroeder, Ruben Alcala, Patrick D. Lomenzo, Claudia Richter
Publikováno v:
Applied Physics Letters. 119:112903
Ferroelectric Hf0.5Zr0.5O2 is a prime candidate material for integrated HfO2-based ferroelectric devices due to its simple composition, low crystallization temperature, and significant remanent polarization. It is particularly promising for integrate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::96d2cdce603239965506ab27f33ed4aa
https://doi.org/10.1063/5.0062789
https://doi.org/10.1063/5.0062789
Autor:
Ruben Alcala, Thomas Mikolajick, Luis Azevedo Antunes, Richard Ganser, Alfred Kersch, Uwe Schroeder
Publikováno v:
Applied Physics Letters. 119:082903
Perturbing tetragonal HfO2 supercells in simulation with dopants or interstitial oxygen in the context of the ferroelectric Pca21 No. 29 (oIII-phase) formation frequently leads to an unexplored, lower energetic orthorhombic crystal phase with space g
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::621fb773c08bccb4de7a99ae8844ce35
https://doi.org/10.1063/5.0063808
https://doi.org/10.1063/5.0063808
Autor:
Jacob L. Jones, Thomas Mikolajick, Patrick D. Lomenzo, Ruben Alcala, Monica Materano, Claudia Richter, Uwe Schroeder, Chuanzhen Zhou
Publikováno v:
Journal of Physics D: Applied Physics. 54:035102
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::16503fffdd828e99e9bf792313c70b5d
https://doi.org/10.1088/1361-6463/abbc98
https://doi.org/10.1088/1361-6463/abbc98