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pro vyhledávání: '"Roy Nilabh K"'
Autor:
Chizari, Samira, Shaw, Lucas A., Behera, Dipankar, Roy, Nilabh K., Zheng, Ximeng, Panas, Robert M., Hopkins, Jonathan B., Chen, Shih-Chi, Cullinan, Michael A.
Publikováno v:
In Precision Engineering March 2021 68:174-186
Autor:
Behera, Dipankar, Chizari, Samira, Shaw, Lucas A., Porter, Michael, Hensleigh, Ryan, Xu, Zhenpeng, Zheng, Ximeng, Connolly, Liam G., Roy, Nilabh K., Panas, Robert M., Saha, Sourabh K., Zheng, Xiaoyu (Rayne), Hopkins, Jonathan B., Chen, Shih-Chi, Cullinan, Michael A.
Publikováno v:
In Precision Engineering March 2021 68:197-205
Autor:
Behera, Dipankar, Chizari, Samira, Shaw, Lucas A., Porter, Michael, Hensleigh, Ryan, Xu, Zhenpeng, Roy, Nilabh K., Connolly, Liam G., Zheng, Xiaoyu (Rayne), Saha, Sourabh, Hopkins, Jonathan B., Cullinan, Michael A.
Publikováno v:
In Precision Engineering March 2021 68:301-318
Autor:
Roy, Nilabh K., Cullinan, Michael A.
Publikováno v:
In Precision Engineering July 2018 53:236-247
Publikováno v:
In Additive Manufacturing May 2018 21:17-29
Autor:
Roy Nilabh K, Takahiro Matsumoto, Ryo Tanaka, Mitsuru Hiura, Yukio Takabahashi, Jin Choi, Yoshio Suzaki, Anshuman Cherala, Atsushi Kimura, Hiroshi Morohoshi
Publikováno v:
Photomask Technology 2022.
Imprint lithography is an effective and well-known technique for replication of nano-scale features. Nanoimprint lithography (NIL) manufacturing equipment utilizes a patterning technology that involves the field-by-field deposition and exposure of a
Autor:
Roy Nilabh K, Hiroyuki Sekiguchi, Takashi Shibayama, Mitsuru Hiura, Anshuman Cherala, Jin Choi, Lou Mingji, Mario J. Meissl, Klein Jeffrey D, Takahiro Yoshida, Xiaoming Lu
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 21
The integration of a NIL into production for advanced memory devices will require compatibility with existing high-end optical lithography processes in order to meet the aggressive overlay performance specifications. To deliver such a demanding overl
Autor:
Hideyuki Wada, Anshuman Cherala, Mitsuru Hiura, Kenji Yamamoto, Kazuhiro Sato, Yoshio Suzaki, Roy Nilabh K, Satoru Jimbo, Jin Choi, Osamu Morimoto, Satoshi Iino
Publikováno v:
Photomask Technology 2021.
Imprint lithography is an effective and well-known technique for replication of nano-scale features. Nanoimprint lithography (NIL) manufacturing equipment utilizes a patterning technology that involves the field/shot-by-field/shot deposition and expo
Akademický článek
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The minimum feature size in most commercially available metal additive manufacturing (AM) processes is limited to ~100 microns which poses a fundamental challenge in fabricating complex 3D micro-components. The authors have developed a microscale sel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::702a702ec83ebfe964d2b53b77520370