Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Roy Hallstein"'
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 645:136-140
At the Charged Particle Optics Conference (CPO7) in 2006, a novel trimer based helium gas field ion source (GFIS) was introduced for use in a new helium ion microscope (HIM), demonstrating the novel source performance attributes and unique imaging ap
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c15278d48e5d8b34fce85839cfcf680e
https://doi.org/10.1016/j.nima.2010.12.220
https://doi.org/10.1016/j.nima.2010.12.220
Publikováno v:
Microscopy and Microanalysis. 22:156-157
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b94318bf165a0ea343e5d5be225dc4ca
https://doi.org/10.1017/s143192761600163x
https://doi.org/10.1017/s143192761600163x
Publikováno v:
International Symposium for Testing and Failure Analysis.
High resolution optical imaging is critical in assisting backside circuit edit (CE) and optical probing navigation. In this paper, we demonstrated improved optical image quality using VIS-NIR narrow band light emitting diode (LED) illumination in var
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a333e4371b3a1d6c06f991379fce4ee7
https://doi.org/10.31399/asm.cp.istfa2012p0505
https://doi.org/10.31399/asm.cp.istfa2012p0505
Autor:
Chris Scheffler, Yariv Drezner, Richard H. Livengood, Shida Tan, Yuval Greenzweig, Roy Hallstein
Publikováno v:
International Symposium for Testing and Failure Analysis.
The requirements for focused ion beam (FIB) systems to provide higher image resolution and machining precision continue to increase with the continuation of Moore’s Law. Due to the shrinking geometry and increasing complex structures and materials,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec510a93b60ee55b551425460b053a70
https://doi.org/10.31399/asm.cp.istfa2012p0436
https://doi.org/10.31399/asm.cp.istfa2012p0436
Publikováno v:
International Symposium for Testing and Failure Analysis.
Focused ion beam (FIB) tools are used to perform "circuit edit," (CE), in which existing integrated circuit devices are modified to create prototype devices that simulate potential mask changes. Although ion milling at low keV is common in TEM sample
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::26c07411c863f894bc4deeaefdfdeb7c
https://doi.org/10.31399/asm.cp.istfa2007p0312
https://doi.org/10.31399/asm.cp.istfa2007p0312
Autor:
Kate L. Klein, Shida Tan, R Livengood, D. M. Shima, Roy Hallstein, András E. Vladár, Yuval Greenzweig
Publikováno v:
Microscopy and Microanalysis. 18:808-809
Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::65d794bed5fe1acc284331ec5ddb4f0e
https://doi.org/10.1017/s1431927612005892
https://doi.org/10.1017/s1431927612005892