Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Roy Anunciado"'
Autor:
Roy Anunciado, Jisun Lee, Ellaheh Barzegar, Stefan van der Sanden, Guillaume Schelcher, Stijn Schoofs
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac7b248aa9324a6f1b790485137600af
https://doi.org/10.1117/12.2637772
https://doi.org/10.1117/12.2637772
Autor:
Junwei Wei, Patrick Wong, Roy Anunciado, Yongjun Wang, Fuming Wang, Hung Yu Tien, Stefan Hunsche, Peng Tang, Anton van Oosten, Bram Slachter, Koen van Ingen Schenau, Fang Wei, Antonio Corradi
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
We present an experimental study of pattern variability and defectivity, based on a large data set with more than 112 million SEM measurements from an HMI high-throughput e-beam tool. The test case is a 10nm node SRAM via array patterned with a DUV i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f015501d0b352076031852b91b73a25d
https://doi.org/10.1117/12.2297603
https://doi.org/10.1117/12.2297603
Autor:
T. Hasan, Patrick Wong, Bart Segers, Wim Tjibbo Tel, Youping Zhang, C. Prentice, Roy Anunciado
Publikováno v:
SPIE Proceedings.
In the advent of multiple patterning techniques in semiconductor industry, metrology has progressively become a burden. With multiple patterning techniques such as Litho-Etch-Litho-Etch and Sidewall Assisted Double Patterning, the number of processin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::111853375aeb25d13a83ac268294acc9
https://doi.org/10.1117/12.2257965
https://doi.org/10.1117/12.2257965
Publikováno v:
The Journal of Chemical Physics. 150:064301
We report on calculations—using the LEVEL and BCONT programs by Le Roy, the latter of which is a version modified by B. McGeehan—of the dependence of the radiative lifetime of the Na2 sodium dimer 41Σg+ shelf-state on the initial vibrational and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7a8b32fdefc396de8e08d3656486f965
https://doi.org/10.1063/1.5053107
https://doi.org/10.1063/1.5053107
Autor:
Maria Barkelid, Ye Tian, Roy Anunciado, Justin K. Hanson, Pavan Samudrala, Shawn Lee, Young Ki Kim, Juan-Manuel Gomez, Peter Nikolsky
Publikováno v:
SPIE Proceedings.
As leading edge lithography moves to advanced nodes, CDU requirements have relatively increased with technologies 14nm/20nm and beyond. In this paper, we want to introduce the methodology to offer an itemized CDU budget such as Intra-field, Inter-fie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cbeb720cb17375bd6dd6630687a98215
https://doi.org/10.1117/12.2214123
https://doi.org/10.1117/12.2214123
Autor:
Vadim Timoshkov, Xinjian Zhou, Marinus Jochemsen, Christopher J. Jones, Roy Anunciado, Stefan Hunsche, Neal Callan
Publikováno v:
SPIE Proceedings.
As process window margins for cutting edge DUV lithography continue to shrink, the impact of systematic patterning defects on final yield increases. Finding process window limiting hot spot patterns and monitoring them in high volume manufacturing (H
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::61078a4d3b6c7a454459e3e72fa53d68
https://doi.org/10.1117/12.2219906
https://doi.org/10.1117/12.2219906
Autor:
Ewould van West, Jin-Soo Kim, Won-Kwang Ma, Myoung-Soo Kim, Kyu-Tae Sun, Peter Nikolsky, Maryana Escalante Marun, Won-Taik Kwon, Greet Storms, Sungki Park, Marian Otter, Young-Sik Kim, Roy Anunciado
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
In this paper we describe the joint development and optimization of the critical dimension uniformity (CDU) at an advanced 300 mm ArFi semiconductor facility of SK Hynix in the high volume device. As the ITRS CDU specification shrinks, semiconductor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ae567d0bc5d284d39dc4280a2594586
https://doi.org/10.1117/12.2057390
https://doi.org/10.1117/12.2057390
Publikováno v:
The Journal of Chemical Physics. 145:174306
Lifetimes of partially resolved ro-vibrational levels of the Na2 21Σu+ double well state have been measured for the first time. Ground state sodium dimer molecules in a molecular beam are resonantly excited by the doubled output of a 10 ns pulsed dy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7df371e79e36434f17580f44a5f513b6
https://doi.org/10.1063/1.4966579
https://doi.org/10.1063/1.4966579