Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Rostislav Velichko"'
Publikováno v:
Materials, Vol 15, Iss 1, p 334 (2022)
Low-temperature activation of oxide semiconductor materials such as In-Ga-Zn-O (IGZO) is a key approach for their utilization in flexible devices. We previously reported that the activation temperature can be reduced to 150 °C by hydrogen-doped IGZO
Externí odkaz:
https://doaj.org/article/4d808f57d70349e3bea241a5e67851e6
Autor:
Rostislav Velichko, Mamoru Furuta, Daiki Tanaka, Yuki Tsuruma, Toshihiro Matsumura, Daichi Sasaki, Taiki Kataoka, Yusaku Magari, Emi Kawashima, Kenta Shimpo
Publikováno v:
SID Symposium Digest of Technical Papers. 52:69-72
Publikováno v:
Japanese Journal of Applied Physics. 60:055503
We investigated the effect of adding small amounts of hydrogen during DC magnetron sputtering of SnO x films followed by annealing in a nitrogen atmosphere at temperatures below the instability of SnO. Hard X-ray photoelectron spectroscopy analysis s