Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Rosario Mollica"'
Publikováno v:
AIP Conference Proceedings.
As production CMOS devices shrink to 90nm and below, the requirements for high quality ion beams increase in medium and high current implant systems. Critical variations in device performance can be related to changes in ion beam properties, such as
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f58d0211583b8873865e9059872d617b
https://doi.org/10.1063/1.2401574
https://doi.org/10.1063/1.2401574
Autor:
D.L. Smatlak, Rosario Mollica, Anthony Renau, Antonella Cucchetti, J.C. Olson, Daniel Distaso, Jay T. Scheuer
Publikováno v:
2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432).
An innovative beam tuning algorithm has been developed for the VIISta 810 200/300 mm medium current implanter resulting in decreased tuning times and increased wafer throughput. Pre-calibrated magnets and a recipe-configurable tuning sequence are at
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a9acca1a1e60f49f9f6561af9f08cae9
https://doi.org/10.1109/iit.2000.924185
https://doi.org/10.1109/iit.2000.924185