Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Rosa, Elisa Brod Oliveira da"'
Autor:
Rosa, Elisa Brod Oliveira da
Publikováno v:
Biblioteca Digital de Teses e Dissertações da UFRGSUniversidade Federal do Rio Grande do SulUFRGS.
O rápido avanço tecnológico coloca a tecnologia do Si diante de um grande desafio: substituir o dielétrico de porta utilizado por mais de 40 anos em dispositivos MOSFET (transistor de efeito de campo metal-óxido-semicondutor), o óxido de silíc
Externí odkaz:
http://hdl.handle.net/10183/2963
Autor:
Pezzi, Rafael Peretti, Krug, Cristiano, Grande, Pedro Luis, Rosa, Elisa Brod Oliveira da, Schiwietz, Gregor, Baumvol, Israel Jacob Rabin
Publikováno v:
Repositório Institucional da UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
An analytical approach to ion energy loss distributions capable of simplifying medium energy ion scattering MEIS spectral analysis is presented. This analytical approach preserves the accuracy of recent numerical models that evaluate energy loss effe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______3056::c173fc27cf94f1a708d42d2ca5d73b77
Autor:
Rosa, Elisa Brod Oliveira da, Baumvol, Israel Jacob Rabin, Morais, Jonder, Almeida, Rita Maria Cunha de, Papaleo, Ricardo Meurer, Stedile, Fernanda Chiarello
Publikováno v:
Repositório Institucional da UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
Aluminum oxide films deposited on silicon by atomic layer chemical vapor deposition were annealed in an ¹⁸O-enriched oxygen atmosphere under various conditions of temperature, time, and pressure. Cavity formation at the film surface was monitored
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______3056::bd76a594c0b1cd238bbe3b6049f2afc1
Autor:
Morais, Jonder, Rosa, Elisa Brod Oliveira da, Pezzi, Rafael Peretti, Miotti, Leonardo, Baumvol, Israel Jacob Rabin
Publikováno v:
Repositório Institucional da UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
The stability of a ZrAlxOy film sputtered on Si upon thermal annealing in vacuum or in O2 was investigated. X-ray diffraction indicated that the as-deposited film was amorphous and remained so after annealing. Rutherford backscattering, narrow nuclea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______3056::0e8c883587daad2d42aff34f2dabc9e5
Autor:
Krug, Cristiano, Rosa, Elisa Brod Oliveira da, Almeida, Rita Maria Cunha de, Morais, Jonder, Baumvol, Israel Jacob Rabin, Salgado, Tania Denise Miskinis, Stedile, Fernanda Chiarello
Publikováno v:
Repositório Institucional da UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______3056::45ff4733dd000fab1d2ff69dc19867e7
Autor:
Morais, Jonder, Rosa, Elisa Brod Oliveira da, Miotti, Leonardo, Pezzi, Rafael Peretti, Baumvol, Israel Jacob Rabin, Rotondaro, Antonio L.P., Bevan, M.J., Colombo, Luigi
Publikováno v:
Repositório Institucional da UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
The effect of postdeposition annealing in vacuum and in dry O2 on the atomic transport and chemical stability of chemical vapor deposited ZrSixOy films on Si is investigated. Rutherford backscattering spectrometry, narrow nuclear resonance profiling,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______3056::9765a028437611677a19dd0bc1c76d95
Autor:
Krug, Cristiano, Rosa, Elisa Brod Oliveira da, Almeida, Rita Maria Cunha de, Morais, Jonder, Baumvol, Israel Jacob Rabin, Salgado, Tania Denise Miskinis, Stedile, Fernanda Chiarello
Publikováno v:
Repositório Institucional da UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
Ultrathin films of Al₂O₃ deposited on Si were submitted to rapid thermal annealing in vacuum or in oxygen atmosphere, in the temperature range from 600 to 800 °C. Nuclear reaction profiling with subnanometric depth resolution evidenced mobility
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______3056::b8f9e72b0c2703906d250757a6c83681