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Publikováno v:
Design for Manufacturability through Design-Process Integration VI.
Lithography development has become extremely computationally intensive. For a particular technology node being developed, it is critical to determine the optimum source and OPC/RET for each layer. In this paper we present a flexible new computation s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::816f50517c704e74f2e311471ba93ba3
https://doi.org/10.1117/12.918057
https://doi.org/10.1117/12.918057
