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pro vyhledávání: '"Ronen Madmon"'
Autor:
Ariel Shkalim, Alexander Chereshnya, Paul Crider, Oren Cohen, Oded Dassa, Ronen Madmon, Evgeny Bal, Ori Petel, Boaz Cohen
Publikováno v:
Photomask Technology 2019.
193nm mask inspection will remain a viable solution for inspection of ArF technology masks for the 7nm/5nm technology node and beyond, even in the era of EUV lithography. In the ArF technology, pitch multiplication (SADP, SAQP, etc.) will continue to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::608d58615ae847a99020564748409baf
https://doi.org/10.1117/12.2537511
https://doi.org/10.1117/12.2537511
