Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Ronald Pandolfi"'
Autor:
Haoran Tang, Shuai Liu, Charles Melton, Ronald Pandolfi, Daniela Ushizima, Dinesh Kumar, Singanallur Venkatakrishnan, Alexander Hexemer, Guillaume Freychet
Publikováno v:
MRS Communications. 9:586-592
Nano-structured thin films have a variety of applications from waveguides, gaseous sensors to piezoelectric devices. Grazing Incidence Small Angle x-ray Scattering images enable classification of such materials. One challenge is to determine structur
Autor:
Juan C. Cornejo, Seung-Tae Woo, D. Hayes, Charles Hyde, Bogdan Wojtsekhowski, Kebin Wang, Seema Dhamija, W. Boeglin, Antonin Vacheret, Kathryn E. Keister, Sirish Nanda, Jennifer Niedziela, D. S. Armstrong, Simon Širca, P. Solvignon, A. Kelleher, T. Holmstrom, K. Kramer, Thomas B. Humensky, Ronald Pandolfi, Ngyen Ton, S. Frullani, Mikhail Niskin, R. Subedi, Geraud Laveissiere, X. Zheng, Douglas Higinbotham, Sergey Abrahamyan, L. J. Kaufman, B. Ma, John J. Lerose, L. Lagamba, J. Gomez, Jian-Ping Chen, Haiyan Gao, Nilanga Liyanage, Lu Wan, P. Monaghan, Raffaele De Leo, Arun Saha, R. J. Feuerbach, B. Craver, Olivier Gayou, Karl Slifer, Jing Yuan, Xiandong Jiang, Stephen J. Bailey, Alexander Shabetai, R. A. Lindgren, V. Laine, L. Zhu, Chia-Cheh Chang, V. Sulkosky, F. Garibaldi, Zein-Eddine Meziani, L. Coman, Florentin Butaru, Yi Qiang, Jaideep Singh, Chao Peng, Arie Beck, R. Michaels, Robert Stringer, David Lhuillier, Konrad A. Aniol, Gerfried Kumbartzki, Gordon D. Cates, Seonho Choi, Paul Ulmer, Mehdi Meziane, Cornelis W. de Jager, Ronald Gilman, A. Camsonne, Peter Markowitz, H. F. Ibrahim, Wolfgang Korsch, Milan Potokar, Ronald Ransome, Xiaohui Zhan, Andrew Puckett, J. O. Hansen, J. M. Finn, M. Iodice, Kirsten Fuoti, A. Kolarkar, Joseph D. Denton, E. Chudakov, Pierre Bertin, Hai-Jiang Lu, Norm Kolb, T. Averett, Kent Paschke, Charles Glashausser, Rikki Roche, R. Snyder, G. M. Urciuoli, F. Cusanno, Bryan J. Moffit, William A. Tobias, F. William Hersman, A. Deur, B. Reitz, E. Voutier, V. A. Punjabi, A.V. Glamazdin, Huan Yao, W. Kim, Kathleen R. McCormick, Demetrius J. Margaziotis
Publikováno v:
Nature Physics
Nature Physics, 2021, 17 (6), pp.687-692. ⟨10.1038/s41567-021-01245-9⟩
Nature Phys.
Nature Phys., 2021, 17 (6), pp.687-692. ⟨10.1038/s41567-021-01245-9⟩
Nature Physics, 2021, 17 (6), pp.687-692. ⟨10.1038/s41567-021-01245-9⟩
Nature Phys.
Nature Phys., 2021, 17 (6), pp.687-692. ⟨10.1038/s41567-021-01245-9⟩
Understanding the nucleon spin structure in the regime where the strong interaction becomes truly strong poses a challenge to both experiment and theory. At energy scales below the nucleon mass of about 1 GeV, the intense interaction among the quarks
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9267332e1c8be862fff40b92546c579b
http://arxiv.org/abs/2103.03333
http://arxiv.org/abs/2103.03333
Autor:
Vincent Sulkosky, Chao Peng, Jian-ping Chen, Alexandre Deur, Sergey Abrahamyan, Konrad A. Aniol, David S. Armstrong, Todd Averett, Stephanie L. Bailey, Arie Beck, Pierre Bertin, Florentin Butaru, Werner Boeglin, Alexandre Camsonne, Gordon D. Cates, Chia-Cheh Chang, Seonho Choi, Eugene Chudakov, Luminita Coman, Juan C. Cornejo, Brandon Craver, Francesco Cusanno, Raffaele De Leo, Cornelis W. de Jager, Joseph D. Denton, Seema Dhamija, Robert Feuerbach, John M. Finn, Salvatore Frullani, Kirsten Fuoti, Haiyan Gao, Franco Garibaldi, Olivier Gayou, Ronald Gilman, Alexander Glamazdin, Charles Glashausser, Javier Gomez, Jens-Ole Hansen, David Hayes, F. William Hersman, Douglas W. Higinbotham, Timothy Holmstrom, Thomas B. Humensky, Charles E. Hyde, Hassan Ibrahim, Mauro Iodice, Xiandong Jiang, Lisa J. Kaufman, Aidan Kelleher, Kathryn E. Keister, Wooyoung Kim, Ameya Kolarkar, Norm Kolb, Wolfgang Korsch, Kevin Kramer, Gerfried Kumbartzki, Luigi Lagamba, Vivien Lainé, Geraud Laveissiere, John J. Lerose, David Lhuillier, Richard Lindgren, Nilanga Liyanage, Hai-Jiang Lu, Bin Ma, Demetrius J. Margaziotis, Peter Markowitz, Kathleen R. McCormick, Mehdi Meziane, Zein-Eddine Meziani, Robert Michaels, Bryan Moffit, Peter Monaghan, Sirish Nanda, Jennifer Niedziela, Mikhail Niskin, Ronald Pandolfi, Kent D. Paschke, Milan Potokar, Andrew Puckett, Vina A. Punjabi, Yi Qiang, Ronald D. Ransome, Bodo Reitz, Rikki Roché, Arun Saha, Alexander Shabetai, Simon Širca, Jaideep T. Singh, Karl Slifer, Ryan Snyder, Patricia Solvignon, Robert Stringer, Ramesh Subedi, William A. Tobias, Ngyen Ton, Paul E. Ulmer, Guido Maria Urciuoli, Antonin Vacheret, Eric Voutier, Kebin Wang, Lu Wan, Bogdan Wojtsekhowski, Seungtae Woo, Huan Yao, Jing Yuan, Xiaohui Zhan, Xiaochao Zheng, Lingyan Zhu
Publikováno v:
Nature Physics. 18:473-473
Autor:
Wolfgang Korsch, P.Y. Bertin, A. Shabetai, N. Kolb, Pete Markowitz, Houbing Lu, T.B. Humensky, K. Kramer, R. Roche, Z. E. Meziani, R. De Leo, Antonin Vacheret, Ronald Ransome, Jaideep Singh, R. J. Feuerbach, M. Iodice, F. Garibaldi, W. U. Boeglin, Nilanga Liyanage, L. J. Kaufman, X. Zhan, J. Yuan, J. Gomez, L. Zhu, R. Stringer, L. Wan, Seung-Tae Woo, H. F. Ibrahim, D. Hayes, L. Lagamba, J. Niedziela, Ronald Pandolfi, Douglas Higinbotham, A.J.R. Puckett, S. Dhamija, K. McCormick, S. L. Bailey, Bogdan Wojtsekhowski, J. P. Chen, V. Laine, E. Chudakov, X. Zheng, S. Frullani, P. Monaghan, S. K. Nanda, B. Craver, Yujie Qiang, G. J. Kumbartzki, D. S. Armstrong, J. O. Hansen, P. E. Ulmer, N. Ton, K. E. Keister, G. Laveissière, J. M. Finn, Simon Širca, B. Ma, K. Wang, B. Hersman, R. A. Lindgren, J. J. LeRose, M. Niskin, A. Saha, A. Kelleher, Karl Slifer, V. Sulkosky, F. Cusanno, Seonho Choi, S. Abrahamyan, Ronald Gilman, A. Deur, A. V. Glamazdin, A. Camsonne, D. Lhuillier, J. C. Cornejo, P. Solvignon, R. Subedi, A. Kolarkar, A. Beck, T. Averett, C. E. Hyde, Kent Paschke, Charles Glashausser, V. A. Punjabi, W. Kim, Haiyan Gao, E. Voutier, M. Potokar, L. Coman, J. D. Denton, B. Reitz, C. C. Chang, Olivier Gayou, K. Fuoti, X. Jiang, D. J. Margaziotis, C. Peng, H. Yao, G. D. Cates, William A. Tobias, R. Snyder, G. M. Urciuoli, C. W. de Jager, K. A. Aniol, Bryan J. Moffit, T. Holmstrom, M. Meziane, F. Butaru, R. Michaels
Publikováno v:
Physics Letters B, Vol 805, Iss, Pp-(2020)
Physics Letters B
Physics Letters B, Elsevier, 2020, 805, pp.135428. ⟨10.1016/j.physletb.2020.135428⟩
Physics Letters B, 2020, 805, pp.135428. ⟨10.1016/j.physletb.2020.135428⟩
Physics Letters B
Physics Letters B, Elsevier, 2020, 805, pp.135428. ⟨10.1016/j.physletb.2020.135428⟩
Physics Letters B, 2020, 805, pp.135428. ⟨10.1016/j.physletb.2020.135428⟩
The spin-structure functions $g_1$ and $g_2$, and the spin-dependent partial cross-section $\sigma_\mathrm{TT}$ have been extracted from the polarized cross-sections differences, $\Delta \sigma_{\parallel}\hspace{-0.06cm}\left(\nu,Q^{2}\right)$ and $
Autor:
D. M. Pelt, Petrus H. Zwart, Guillaume Freychet, Stefano Marchesini, Chao Yang, A. Hexemer, Dinesh Kumar, Harinarayan Krishnan, L. Lin, Ronald Pandolfi, David A. Shapiro, Jeffrey J. Donatelli, Dula Parkinson, Marcus M. Noack, M. MacNeil, Pablo Enfedaque, Kanupriya Pande, Huibin Chang, Maciej Haranczyk, X. Mo, Xiaoye S. Li, Talita Perciano, Daniela Ushizima, Zixi Hu, O. Jain, James A. Sethian
Publikováno v:
Handbook on Big Data and Machine Learning in the Physical Sciences
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::90941c653664c09e0f493710e4ce9919
https://doi.org/10.1142/9789811204579_0012
https://doi.org/10.1142/9789811204579_0012
Autor:
Christopher L. Anderson, Ronald Pandolfi, Terry McAfee, Guillaume Freychet, Cheng Wang, Alexander Hexemer, Patrick P. Naulleau, Dinesh Kumar, Isvar A. Cordova
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2018.
Extreme ultraviolet lithography is one of the most promising printing techniques for high volume semiconductor manufacturing at the 14 nm half-pitch device node and beyond. However, key challenges around EUV photoresist materials such as the exposure
Autor:
Patrick P. Naulleau, Ronald Pandolfi, Regis J. Kline, Alexander Hexemer, Joseph Strzalka, Guillaume Freychet, Masafumi Fukuto, Dinesh Kumar, Daniel F. Sunday, D. Staacks
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
With the advent of high brightness sources and fast detectors, there is a possibility for combining fast X-ray acquisition with high-speed data treatment to reach the timescale for an effective in-line characterization method. We will highlight two r
Autor:
Jason E. Hein, Lauren Edwards, Linda S. Hirst, Ronald Pandolfi, Blessing Huynh Cao, Makiko Quint, Andrea L. Rodarte, Sayantani Ghosh, Harmanpreet Panesar
Publikováno v:
Soft matter, vol 11, iss 9
Rodarte, AL; Cao, BH; Panesar, H; Pandolfi, RJ; Quint, M; Edwards, L; et al.(2015). Self-assembled nanoparticle micro-shells templated by liquid crystal sorting. Soft Matter, 11(9), 1701-1707. doi: 10.1039/c4sm02326a. UC Merced: Retrieved from: http://www.escholarship.org/uc/item/6zf8g5h8
Rodarte, AL; Cao, BH; Panesar, H; Pandolfi, RJ; Quint, M; Edwards, L; et al.(2015). Self-assembled nanoparticle micro-shells templated by liquid crystal sorting. Soft Matter, 11(9), 1701-1707. doi: 10.1039/c4sm02326a. UC Merced: Retrieved from: http://www.escholarship.org/uc/item/6zf8g5h8
© The Royal Society of Chemistry 2015. A current goal in nanotechnology focuses on the assembly of different nanoparticle types into 3D organized structures. In this paper we report the use of a liquid crystal host phase in a new process for the gen
Publikováno v:
Ren, F; Pandolfi, R; Van Campen, D; Hexemer, A; & Mehta, A. (2017). On-the-fly data assessment for high-throughput X-ray diffraction measurements. ACS Combinatorial Science, 19(6), 377-385. doi: 10.1021/acscombsci.7b00015. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/4gx629rs
ACS combinatorial science, vol 19, iss 6
ACS combinatorial science, vol 19, iss 6
© 2017 American Chemical Society. Investment in brighter sources and larger and faster detectors has accelerated the speed of data acquisition at national user facilities. The accelerated data acquisition offers many opportunities for the discovery
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::75d381ccaead3a7f650ee1cd10f3cac6
http://arxiv.org/abs/1709.09261
http://arxiv.org/abs/1709.09261
Autor:
Ronald Pandolfi, Patrick P. Naulleau, Scott Dhuey, Christopher L. Anderson, Terry McAfee, Isvar A. Cordova, Dinesh Kumar, Cheng Wang, Alexander Hexemer, Guillaume Freychet
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 18:1
Extreme ultraviolet (EUV) lithography is one of the most promising printing techniques for high-volume semiconductor manufacturing at the 14-nm half-pitch device node and beyond. However, key challenges around EUV photoresist materials, such as the e