Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Ronald P. Albright"'
Autor:
J. Lauria, Ronald P. Albright, Bert van Drieenhuizen, Luoqi Chen, Olga Vladimirsky, Ann Witvrouw, Maarten Hoeks, R. Vanneer, Luc Haspeslagh
Publikováno v:
Microelectronic Engineering. 86:569-572
The imaging capability of a new spatial light modulator, (SLM), a custom MEMS device is presented. Low k"1 factor aerial image measurements show the suitability of the SLM device for a variety of uses including optical maskless lithography (OML) appl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c7a878dcbc7038fe4ac5c6a6af8ba582
https://doi.org/10.1016/j.mee.2008.11.022
https://doi.org/10.1016/j.mee.2008.11.022
Autor:
Jason D. Hintersteiner, Nabila Baba-Ali, Sherman K. Poultney, Azat Latypov, Ronald P. Albright, Wenceslao A. Cebuhar, Ebo H. Croffie, Elizabeth Stone, Nicholas K. Eib
Publikováno v:
SPIE Proceedings.
In Optical Maskless Lithography, the die pattern to be printed is generated by a contrast device, known as a Spatial Light Modulator. The contrast device consists of a multitude of micro-mirror pixels that are independently actuated. Different physic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::97a864fd60a74a0aa7c31f29565a4f8f
https://doi.org/10.1117/12.658690
https://doi.org/10.1117/12.658690
Autor:
Elizabeth Stone, Wenceslao A. Cebuhar, Ronald P. Albright, Nabila Baba-Ali, Jason D. Hintersteiner, Azat Latypov
Publikováno v:
SPIE Proceedings.
In Optical Maskless Lithography (OML), the die pattern to be printed is generated by a contrast device known as Spatial Light Modulator (SLM), consisting of a multitude of pixels. Each pixel is independently actuated so as to change its optical prope
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2c7d129d4afc3267e051259168b4374
https://doi.org/10.1117/12.600241
https://doi.org/10.1117/12.600241