Zobrazeno 1 - 10
of 122
pro vyhledávání: '"Ronald G Dixson"'
Autor:
Lindsay C. C. Elliott, Adam L. Pintar, Craig R. Copeland, Thomas B. Renegar, Ronald G. Dixson, B. Robert Ilic, R. Michael Verkouteren, Samuel M. Stavis
Publikováno v:
Anal Chem
Gravimetry typically lacks the resolution to measure single microdroplets, whereas microscopy is often inaccurate beyond the resolution limit. To address these issues, we advance and integrate these complementary methods, introducing simultaneous mea
Publikováno v:
J Vac Sci Technol B Nanotechnol Microelectron
This paper reports high-throughput, light-based, through-focus scanning optical microscopy (TSOM) for detecting industrially relevant sub-50 nm tall nanoscale contaminants. Measurement parameter optimization to maximize the TSOM signal using optical
Publikováno v:
J Micro Nanolithogr MEMS MOEMS
Nanoscale wear affects the performance of atomic force microscopy (AFM)-based measurements for all applications including process control measurements and nanoelectronics characterization. As such, methods to prevent or reduce AFM tip wear is an area
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a4b9f2dd45a59318624ac77fa3951d25
https://europepmc.org/articles/PMC7724968/
https://europepmc.org/articles/PMC7724968/
Publikováno v:
Ultramicroscopy. 194:199-214
Atomic force microscopes (AFMs) are commonly and broadly regarded as being capable of three-dimensional imaging. However, conventional AFMs suffer from both significant functional constraints and imaging artifacts that render them less than fully thr
Autor:
Ndubuisi G. Orji, Sebastian W. Schmidt, Hiroshi Itoh, Ronald G. Dixson, Peter S. Walecki, Bernd Irmer, Chumei Wang
Publikováno v:
Ultramicroscopy. 162:25-34
In atomic force microscopy (AFM) metrology, the tip is a key source of uncertainty. Images taken with an AFM show a change in feature width and shape that depends on tip geometry. This geometric dilation is more pronounced when measuring features wit
Autor:
Sang-Soo Choi, Dong Ryoung Lee, Bryan M. Barnes, Ronald G. Dixson, Martin Y. Sohn, Richard M. Silver
Publikováno v:
Photomask Technology.
A critical challenge in optical critical dimension metrology, that requires high measurement sensitivity as well as high throughput, is the dimensional measurements of features sized below the optical resolution limit. This paper investigates the rel
Publikováno v:
Journal of micro/nanolithography, MEMS, and MOEMS : JM3. 15(1)
Sidewall sensing in critical dimension atomic force microscopes (CD-AFMs) usually involves continuous lateral dithering of the tip or the use of a control algorithm and fast response piezo actuator to position the tip in a manner that resembles touch
Publikováno v:
Thin Solid Films. 519:2633-2636
We use azimuthally resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line width roughness (LWR). We model the artificially perturbed grating using one- and two-dimens
Autor:
Ronald G. Dixson
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 17:1
One type of atomic force microscopy (AFM) used for critical dimension (CD) metrology is commonly referred to as CD-AFM; it uses flared tips and two-dimensional (2-D) surface sensing to enable scanning of features with near-vertical sidewalls. An impo
Autor:
Stewart Smith, Ronald G. Dixson, James E. Potzick, Anthony J. Walton, Michael W. Cresswell, J.T.M. Stevenson, R.A. Allen, M. McCallum, Andreas Tsiamis, A.C. Hourd, Ndubuisi G. Orji
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 22:72-79
This paper compares electrical, optical, and atomic force microscope (AFM) measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the abov