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pro vyhledávání: '"Ronald Bozak"'
Autor:
Jeff LeClaire, Gregory McIntyre, Emily Gallagher, Ronald Bozak, Tod Robinson, Roy White, Mark Lawliss
Publikováno v:
SPIE Proceedings.
Mask defectivity is often cited as a barrier to EUVL manufacturing, falling just behind low source power. Mask defectivity is a combination of intrinsic blank defects, defects introduced during the mask fabrication and defects introduced during the u
Autor:
Ronald Bozak, David P. Mancini, D. J. Resnick, William J. Dauksher, David Lee, Roy White, L. Casoose, Jeffrey E. Csuy, Kevin J. Nordquist, K. Gehoski, Ngoc V. Le
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22:3306
In order for step and flash imprint lithography (S-FIL) to become a truly viable manufacturing technology, infrastructure including template repair must be commercially available. Extensive template repair studies were undertaken using RAVE’s nm 65