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Autor:
Mark C. Kelling, Bernd Schulz, Jon-Tobias Hoeft, Matthew Sendelbach, William A. Muth, Benjamin Bunday, M. Zaitz, Andrew Brendler, Alok Vaid, Eric P. Solecky, Ron Fiege, Bill Banke, Srinivasan Rangarajan, Carlos Strocchia-Rivera, Andres Munoz, Carsten Hartig, John A. Allgair, Dmitriy Shneyder, Chas Archie
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXIII.
Ever shrinking measurement uncertainty requirements are difficult to achieve for a typical metrology toolset, especially over the entire expected life of the fleet. Many times, acceptable performance can be demonstrated during brief evaluation period
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::55aec1cd51f9aaf9d919e62dafa19930
https://doi.org/10.1117/12.814089
https://doi.org/10.1117/12.814089
