Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Roman Salij"'
Publikováno v:
Optifab 2007: Technical Digest.
For many years, Chemical Mechanical Planarization (CMP) has enabled the fabrication of highperformance multilevel integrated circuits for the electronics industry. While CMP techniques are now being used in the manufacturing of optical devices, the c
Publikováno v:
SPIE Proceedings.
Chemical Mechanical Polishing, also referred to Chemical Mechanical Planarization (CMP), is one of the enabling technologies which allows the fabrication of high performance multi-level metal structures in IC fabrication. In this paper we will discus
Autor:
Roman Salij, John Clark, Jeffrey Gilliland, Alicia Walters, Tamara Vincer, Stanley Lesiak, Kevin Moeggenborg
Publikováno v:
Frontiers in Optics.
Chemical-Mechanical Polishing (CMP) was developed for semiconductor manufacturing to allow rapid, reproducible polishing of varied materials. This paper discusses benefits and challenges of CMP for optics manufacturing using aluminum mirror polishing
Publikováno v:
Proceedings of SPIE; 4/2/2017, Vol. 10316, p1-4, 4p
Autor:
Tillack, M. S., Pulsifer, J. E.
Publikováno v:
2007 IEEE 22nd Symposium on Fusion Engineering; 2007, p1-4, 4p
Autor:
Salij, Roman Roman.Salij@MatSci.com, Karlson, Karl Karl.Karson@MatSchi.com
Publikováno v:
Appliance Design. May2012, Vol. 60 Issue 5, p26-28. 3p.
This book shares insights on post-processing techniques adopted to achieve precision-grade surfaces of additive manufactured metals including material characterization techniques and the identified material properties. Post-processes are discussed fr
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