Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Roland Vanmeirhaeghe"'
Autor:
Karl Opsomer, Werner Knaepen, Jean Jordan-Sweet, Christian Lavoie, Roland Vanmeirhaeghe, Christophe Detavernier, K. De Keyser, Filip Geenen
Publikováno v:
Thin Solid Films. 551:86-91
The solid state reaction between 30 nm Pd films and various Ge substrates (Ge(100), Ge(111), polycrystalline Ge and amorphous Ge) was studied by means of in situ X-ray diffraction and in situ sheet resistance measurements. The reported phase sequence
Autor:
Jolien Dendooven, Christophe Detavernier, Davy Deduytsche, Jan Musschoot, Roland Vanmeirhaeghe
Publikováno v:
Journal of The Electrochemical Society. 157:G111
This paper focuses on the conformality of the plasma-enhanced atomic layer deposition (PE-ALD) of Al2O3 using trimethylaluminum [Al(CH3)(3); (TMA)] as a precursor and O-2 plasma as an oxidant source. The conformality was quantified by measuring the d
Autor:
Christophe Detavernier, Jan Musschoot, Davy Deduytsche, Roland Vanmeirhaeghe, Jolien Dendooven
Publikováno v:
Atomic Layer Deposition, 9th Baltic conference
The key advantage of atomic layer deposition (ALD) is undoubtedly the excellent step coverage, which allows for conformal deposition of thin films in high-aspect-ratio structures. In this paper, a model is proposed to predict the deposited film thick
Autor:
Wouter Leroy, Roland Vanmeirhaeghe, Dirk Poelman, Christian Lavoie, Davy Deduytsche, Christophe Detavernier
Publikováno v:
Acta Crystallographica Section A Foundations of Crystallography. 62:s114-s114