Hardness and stiffness of amorphous SiCxNy chemical vapor deposited coatings

Autor: Eric Bêche, Abderrahim Bendeddouche, René Berjoan, Roger Hillel

Publikováno v: Surface and Coatings Technology. 111:184-190

Thick amorphous SiCxNy coatings have been deposited by chemical vapor deposition at 1000–1200 °C from the TMS–NH3–H2 system. Hardness (H) and stiffness (E) were measured by nanoindentation with a Berkovich indenter. The relative influence on H

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5c3951844131892ebbaab9541724254c
https://doi.org/10.1016/s0257-8972(98)00733-6

Oxidation behavior of CVD TiN–Ti5Si3 composite coatings

Autor: Francois Sibieude, G Llauro, F Gourbilleau, Roger Hillel

Publikováno v: Thin Solid Films. 315:336-344

Titanium silicide Ti 5 Si 3 has been introduced in TiN coatings by in situ chemical vapor deposition (CVD) in order to improve their oxidation resistance. The behaviors of these TiNSi composites and of pure TiN in air have been compared in the range

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::8c82249f7b07e52ea54617fa262bda85
https://doi.org/10.1016/s0040-6090(97)00795-5

Microcomposite and Nanocomposite Structures from Chemical Vapor Deposition in the Silicon-Titanium-Carbon System

Autor: Muriel Touanen, Mohammed Maline, Jean Luc Derep, Roger Hillel, Francis Teyssandier, M. Ducarroir

Publikováno v: Journal of the American Ceramic Society. 76:1473-1481

Microcomposite and nanocomposite structures composed of SiC-TiC and C have been prepared by chemical vapor deposition at atmospheric pressure (APCVD) from an initial gaseous mixture with the composition C[sub 4]H[sub 10]-SiH[sub 2]Cl[sub 2]-TiCl[sub

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::2ae777ff395bac239f3fe9e5527e42ae
https://doi.org/10.1111/j.1151-2916.1993.tb03928.x

SiCN Amorphous Materials Chemical Vapour Deposited Using the Si(CH3)4-NH3-H2 System

Autor: Roger Hillel, V. Serin, Robert Carles, S. Schamm, René Berjoan, E. Bêche, A. Bendeddouche

Publikováno v: Journal de Physique IV Proceedings
Journal de Physique IV Proceedings, EDP Sciences, 1995, 05 (C5), pp.C5-793-C5-800. ⟨10.1051/jphyscol:1995594⟩
Journal de Physique IV Proceedings, EDP Sciences, 1995, 5 (C5), pp.793-800. ⟨10.1051/jphyscol:1995594⟩
Journal de Physique IV Proceedings, 1995, 5 (C5), pp.793-800. ⟨10.1051/jphyscol:1995594⟩

International audience; Elaboration of amorphous SiCN materials was perfomed using a conventional thermaly activated CVD at 1000-1200°C from the TMS-NH3-H2 system. The influence on the deposition rate and the composition was investigated using an ex

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8f63c5ffa2cbf6876da9d238a7b495cb
https://hal.archives-ouvertes.fr/jpa-00253957/file/ajp-jp4199505C594.pdf

Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.