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Autor:
M. Usoltceva, Stéphane Heuraux, R. Ochoukov, H. Fuenfgelder, A. Kostic, Jean-Marie Noterdaeme, Anton Nikiforov, Eric Faudot, Dirk Van Eester, Jonathan Jacquot, Rodolphe D’ Inca, I. Shesterikov, Kristel Crombé, Helmut Faugel, Fabrice Louche
Publikováno v:
Plasma Science and Technology-Basic Fundamentals and Modern Applications
Plasma science and technology : basic fundamentals and modern applications
Plasma Science and Technology
Plasma science and technology : basic fundamentals and modern applications
Plasma Science and Technology
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0cfdf3e73565a9e883095e255449e6f0
http://www.intechopen.com/articles/show/title/a-test-facility-to-investigate-sheath-effects-during-ion-cyclotron-resonance-heating
http://www.intechopen.com/articles/show/title/a-test-facility-to-investigate-sheath-effects-during-ion-cyclotron-resonance-heating