Contribution of ions to the growth of amorphous, polymorphous, and microcrystalline silicon thin films.

Autor: Hamers, E. A. G., Fontcuberta i Morral, A., Niikura, C., Brenot, R., Rocai i Cabarrocas, P.

Publikováno v: Journal of Applied Physics; 9/15/2000, Vol. 88 Issue 6, p3674, 15p, 1 Color Photograph, 3 Charts, 16 Graphs