Zobrazeno 1 - 10
of 30
pro vyhledávání: '"Robert W. Gedridge"'
Autor:
Richard D. Ernst, Bernd Weber, Frank H. Köhler, Robert Tomaszewski, Wimonrat Trakarnpruk, Robert W. Gedridge, Rüdiger Mölle, Atta M. Arif, Rehan Basta, Werner Strauss
Publikováno v:
Organometallics. 22:1923-1930
The syntheses and characterizations of the M[1,5-(Me3Si)2C5H5]2 complexes for M = V and Cr have been achieved, as well as that for the unsymmetric Cr[1-Me3Si-3-MeC5H5]2. Structural data for the vanadium complex reveal substantial steric crowding, in
Autor:
Robert W. Gedridge, Laurence P. Sadwick, Thomas J. Groshens, H.H. Ryu, Gerald B. Stringfellow
Publikováno v:
Journal of Crystal Growth. 172:1-4
For the first time, single crystalline layers of indium phosphide (InP) have been grown by the chemical beam epitaxy (CBE) technique without thermally precracking the phosphorus (P) source. This was accomplished using a novel P precursor, tertiarybut
Publikováno v:
Journal of Organometallic Chemistry. 501:95-100
Reactions of titanium(II) or zirconium(IV) chlorides with two or four equivalents of K[1,5-(Me 3 Si) 2 C 5 H 5 ], respectively, lead to the diamagnetic 14-electron M[1,5-(Me 3 Si) 2 C 5 H 5 ] 2 complexes. Both have been characterized analytically, sp
Publikováno v:
Magnetic Resonance in Chemistry. 33:441-448
125Te, 13C and 1H NMR studies on a series of symmetric diorganotellurium(II) [R2 Te, where R = Me, Et, n-Bu, CH2SiMe3, allyl, vinyl, CCMe, CCEt, CC(n-Pr), CC(t-Bu), CC(SiMe3) and CCPh], unsymmetric diorganotellurium(II) (RTeR′) (where R = allyl, R
Publikováno v:
Journal of Crystal Growth. 151:1-8
The organometallic vapor phase epitaxial (OMVPE) growth of GaSb using a new Sb source, trisdimethylaminoantimony (TDMASb) is described for a wide temperature range between 450 and 600° C. Good surface morphologies were obtained at low VIII ratios du
Publikováno v:
Journal of Crystal Growth. 143:15-21
Many new Sb sources for organometallic vapor phase epitaxial (OMVPE) growth of low energy band gap III/V antimonides have been developed and tested. However, most of the precursors including trimethylantimony (TMSb), triisopropylantimony (TIPSb), dii
Publikováno v:
Journal of Crystal Growth. 132:371-376
Low growth temperatures are necessary for the organometallic vapor phase epitaxial growth of many III/V semiconductors, particularly the low energy band gap antimonides. This has caused difficulties with conventional, established precursors because o
Publikováno v:
Journal of Organometallic Chemistry. 456:31-34
A series of organoindium amido compounds have been prepared for use as dopants in the organometallic vapor phase epitaxy (OMVPE) of II–VI semiconductor materials. Thus, reaction of tBu2InCl or iPr2InCl with the appropriate lithium or sodium dialkyl
Publikováno v:
Chemistry of Materials. 5:979-982
Publikováno v:
Organometallics. 12:1553-1558