Zobrazeno 1 - 10
of 31
pro vyhledávání: '"Robert L. Waterland"'
Autor:
Robert L. Waterland, A. R. Ravishankara, Paul Marshall, Munkhbayar Baasandorj, James B. Burkholder
Publikováno v:
The Journal of Physical Chemistry A. 122:4635-4646
Rate coefficients, k, for the gas-phase reaction of the OH radical with (E)-CF3CH═CHCF3 ((E)-1,1,1,4,4,4-hexafluoro-2-butene, HFO-1336mzz(E)) were measured over a range of temperatures (211–374 K) and bath gas pressures (20–300 Torr; He, N2) us
Autor:
Munkhbayar, Baasandorj, Paul, Marshall, Robert L, Waterland, A R, Ravishankara, James B, Burkholder
Publikováno v:
The journal of physical chemistry. A. 122(19)
Rate coefficients, k, for the gas-phase reaction of the OH radical with ( E)-CF
Publikováno v:
Journal of Chemical Theory and Computation. 7:2556-2567
The application of hopping theory to predict charge (hole) mobility in amorphous organic molecular materials is studied in detail. Application is made to amorphous cells of N,N'-diphenyl-N,N'-bis-(3-methylphenylene)-1,1'-diphenyl-4,4'-diamine (TPD),
Autor:
W. T. Hutzell, Stephen O. Andersen, John P. Rugh, Kristen N. Taddonio, Stella Papasavva, Deborah Luecken, Robert L. Waterland
Publikováno v:
Environmental Science & Technology. 44:343-348
We use a regional-scale, three-dimensional atmospheric model to evaluate U.S. air quality effects that would result from replacing HFC-134a in automobile air conditioners in the U.S. with HFO-1234yf. Although HFO-1234yf produces tropospheric ozone, t
Autor:
Tuyu Xie, Robert L. Waterland, Douglas J. Adelman, William J. Marshall, Rupert Spence, Brian M. Fish, Barbara Bobik Fones, Paul D. Soper, Alex Sergey Ionkin, Matthew F. Schiffhauer
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 46:585-611
Series of Fe(II) and Fe(III) tridentate bis(imino)pyridine complexes without nitrilo groups 2-6 and with nitrilo groups 7-13 were synthesized. According to X-ray analysis, the introduction of nitrilo groups in para- and ortho-positions tends to resul
Autor:
Robert L. Waterland, Kerwin D. Dobbs
Publikováno v:
The Journal of Physical Chemistry A. 111:2555-2562
Linear perfluorinated aldehydes (PFALs, CnF2n+1CHO) are important intermediate species in the atmospheric oxidation pathway of many polyfluorinated compounds. PFALs can be further oxidized in the gas phase to give perfluorinated carboxylic acids (PFC
Autor:
Robert C. Buck, James C Ball, Robert L. Waterland, Fabio E Malanca, Malisa S. Chiappero, Steven T Wooldridge, Timothy J Wallington, Gustavo A Argüello, Michael D Hurley
Publikováno v:
The Journal of Physical Chemistry A. 110:11944-11953
The UV absorption spectra of CF(3)CHO, C(2)F(5)CHO, C(3)F(7)CHO, C(4)F(9)CHO, CF(3)CH(2)CHO, and C(6)F(13)CH(2)CHO were recorded over the range 225-400 nm at 249-297 K. C(x)F(2)(x)(+1)CHO and C(x)F(2)(x)(+1)CH(2)CHO have broad absorption features cen
Autor:
A. Toft, Timothy J. Wallington, Tomoki Nakayama, Robert C. Buck, Michael D. Hurley, Yutaka Matsumi, Robert L. Waterland, Ole John Nielsen, M. P. Sulbaek Andersen
Publikováno v:
Journal of Photochemistry and Photobiology A: Chemistry. 176:124-128
Long-path length FT-IR-smog chamber techniques were used to study the title reactions in 700 Torr of N 2 or N 2 /O 2 , diluent at 296 K. There was no discernable effect of C x F 2 x + 1 -group size on the reactivity of C x F 2 x + 1 CH CH 2 towards C
Autor:
James C. Ball, Mitsuo Kawasaki, Timothy J. Wallington, M. P. Sulbaek Andersen, Michael D. Hurley, Y. Hashikawa, Robert L. Waterland, Ole John Nielsen
Publikováno v:
University of Copenhagen
The UVand IR spectra of CxF2x+1CHO (x = 1–4) were investigated using computational and experimental techniques. CxF2x+1CHO (x =1 – 4) have broad UV absorption features centered at 300–310 nm. The maximum absorption cross-section increases signi
Autor:
Robert L. Waterland, Robert Clayton Wheland, Andrew Edward Feiring, Amy M. Rinehart, Bruce E. Smart, Kerwin D. Dobbs
Publikováno v:
Journal of Fluorine Chemistry. 122:37-46
In its continuing quest for smaller length scales, the electronics industry plans to introduce 157 nm as the next lithographic wavelength. Accordingly, there is a pressing need to develop photoresists that are more transparent, and pellicles that are