Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Robert L. Cobene"'
Autor:
Mehrban Jam, Richard E. Elder, Alison Chaiken, Ohseung Kwon, A. Jeans, Marcia Almanza-Workman, Hao Luo, Bob Garcia, Carl Phillip Taussig, Hyung-Jun Kim, Ping Palo Alto Mei, Warren B. Jackson, Craig M. Perlov, Robert L. Cobene
Publikováno v:
Journal of nanoscience and nanotechnology. 10(11)
This paper describes an approach of combining nanofabrication techniques with roll-to-roll fabrication of thin film transistor backplanes for flexible display applications.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8d15db8d9a5ea78576f202a7b6d95a6d
https://pubmed.ncbi.nlm.nih.gov/21137949
https://pubmed.ncbi.nlm.nih.gov/21137949
Autor:
Mehrban Jam, Ohseung Kwon, Albert Jeans, Dan Stieler, Jason Hauschildt, Robert A. Garcia, Craig Perlov, Robert L. Cobene, Ping Mei, Mark T. Smith, Fernando Gomez-Pancorbo, Marcia Almanza-Workman, Steve Braymen, Carl Taussig, Frank Jeffrey, John Maltabes, Hao Luo, Han-Jun Kim, Richard E. Elder, Warren B. Jackson, Kelly Junge, Don Larson
Publikováno v:
SPIE Proceedings.
A solution to the problems of roll-to-roll lithography on flexible substrates is presented. We have developed a roll-toroll imprint lithography technique to fabricate active matrix transistor backplanes on flexible webs of polyimide that have a blank
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f077d89b9c9c23659124875aca340da3
https://doi.org/10.1117/12.852268
https://doi.org/10.1117/12.852268
Publikováno v:
Journal of Materials Chemistry. 21:14185
Self-aligned imprint lithography (SAIL) enables the patterning and alignment of submicron-sized features on metre-scaled flexible substrates in the roll-to roll (R2R) environment. SAIL solves the problem of precision interlayer registry on a moving w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f1e0b35c887fe4da40fd484657251abc
https://doi.org/10.1039/c1jm10848d
https://doi.org/10.1039/c1jm10848d
Autor:
Robert A. Garcia, Ping Mei, Albert Jeans, Carl Taussig, Richard E. Elder, Frank Jeffrey, John Maltabes, Ohseung Kwon, Hao Luo, Mark T. Smith, Lihua Zhao, Robert L. Cobene, Han-Jun Kim, Mehrban Jam, Warren B. Jackson, Marcia Almanza-Workman, Craig Perlov
Publikováno v:
SID Symposium Digest of Technical Papers. 41:1151
HP and Phicot are planning the world's first R2R (roll-to-roll) manufacturing line for display backplanes based on the SAIL (Self-Aligned Imprint Lithography) process. Economic benefits for R2R compared to batch, cost comparisons of different R2R pro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1cf93459a6ac4c69425fc33867a4356d
https://doi.org/10.1889/1.3499870
https://doi.org/10.1889/1.3499870
Publikováno v:
Journal of Materials Chemistry; Sep2011, Vol. 21 Issue 37, p14185-14192, 8p