Zobrazeno 1 - 10
of 126
pro vyhledávání: '"Robert L. Brainard"'
Publikováno v:
Advances in Patterning Materials and Processes XL.
Autor:
Greg Denbeaux, Nabihah Azhari, Ruiwen Ai, Benjamin Kahl, Micah Painter, Zachary Adamson, Ashley Aldrin, Eshan Dilina Thilakarathna, Ankit Choudhary, Robert L Brainard
Publikováno v:
Japanese Journal of Applied Physics.
The ability of chemically amplified resists to transfer an aerial image at increasingly smaller dimensions is critical to extreme ultraviolet (EUV) lithography success at increasingly smaller process nodes. Stochastic inhomogeneities in resist exposu
Autor:
Robert L. Brainard, Eric Y. Liu, Hyeonseon Choi, Gregory Denbeaux, Maximilian Weires, Amir Hegazy
Publikováno v:
Journal of Photopolymer Science and Technology. 34:63-70
Autor:
Robert L. Brainard, Jodi Grzeskowiak, Nitinkumar S. Upadhyay, Maximillian Weires, Munsaf Ali, Michael C. Murphy, James Passarelli
Publikováno v:
Journal of Photopolymer Science and Technology. 34:117-121
Autor:
Maximilian Weires, Nitinkumar S. Upadhyay, Michael C. Murphy, Robert L. Brainard, Philip Schuler, Shaheen Hasan, Greg Denbeaux
Publikováno v:
Journal of Photopolymer Science and Technology. 34:81-86
Publikováno v:
Journal of Polymer Science. 58:787-791
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
The acid-catalyzed cleavage of carbon-oxygen bonds is one of the most critical reaction occurring during image formation using chemically-amplified photoresists. Described here is an approach to modelling these important reactions using Spartan'18 so
Autor:
Michael C. Murphy, Maximilian Weires, Jodi Grzeskowiak, Robert L. Brainard, James V. Passarelli
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
Antimony(V) carboxylate photoresists incorporating polymerizable olefins have demonstrated high photospeeds. The work of Passarelli et al. reported a sensitivity hypothesis, polymerizable olefin loading (POL), in which an increase in photospeed corre
Publikováno v:
Journal of Photopolymer Science and Technology. 31:233-242
Autor:
Leonidas E. Ocola, Amrit Narasimhan, Liam Wisehart, Greg Denbeaux, Steven Grzeskowiak, Robert L. Brainard
Publikováno v:
Journal of Photopolymer Science and Technology. 30:113-120