Zobrazeno 1 - 10
of 31
pro vyhledávání: '"Robert Clayton Wheland"'
Autor:
Robert Clayton Wheland, Barbara Bobik Fones, Hoang Tran, Mureo Kaku, Luke W. Brubaker, Douglas J. Adelman, John J. Schmieg, Roger H. French, Jerald Feldman, M. F. Lemon, Michael T. Mocella, Weiming Qiu, Min K. Yang, Brian E. Fischel, Osami Nagao
Publikováno v:
Journal of Photopolymer Science and Technology. 20:729-738
Autor:
Robert L. Waterland, Robert Clayton Wheland, Andrew Edward Feiring, Amy M. Rinehart, Bruce E. Smart, Kerwin D. Dobbs
Publikováno v:
Journal of Fluorine Chemistry. 122:37-46
In its continuing quest for smaller length scales, the electronics industry plans to introduce 157 nm as the next lithographic wavelength. Accordingly, there is a pressing need to develop photoresists that are more transparent, and pellicles that are
Autor:
Roger H. French, M. K. Crawford, Frank Leonard Schadt, Robert Clayton Wheland, Fredrick Claus Zumsteg, William B. Farnham, A. E. Feiring, Jerald Feldman, Kenneth W. Leffew, Viacheslav A. Petrov
Publikováno v:
Journal of Fluorine Chemistry. 122:11-16
Photolithography at 157 nm requires development of new photoresists that are highly transparent at this wavelength. Transparent fluoropolymer platforms have been identified which also possess other materials properties required for chemically amplifi
Autor:
V. F. Cherstkov, Roger H. French, Robert Clayton Wheland, Nina I Delaygina, Viacheslav A. Petrov, Edward Zhang, M. F. Lemon, Joseph S. Gordon, Weiming Qiu
Publikováno v:
Journal of Fluorine Chemistry. 122:63-80
With the advent of 157 nm as the next photolithographic wavelength, there has been a need to find transparent and radiation durable polymers for use as soft pellicles. Pellicles are � 1 mm thick polymer membranes used in the photolithographic repro
Publikováno v:
Journal of Vinyl and Additive Technology. 4:229-232
Teflon PTFE, FEP, and low melting HFP/TFE copolymers can be made to have excellent adhesion to substrates if residual stresses from large changes in temperature can be eliminated. PTFE and FEP can be adhered using a high boiling saturated perfluorina
Autor:
K. E. Krohn, M. F. Lemon, L. Brubaker, Robert Clayton Wheland, Hoang Vi Tran, D. Hardy, S. J. McLain, Mureo Kaku, O. Nagao, Roger H. French, Douglas J. Adelman, Jerald Feldman, Charles Y. Chen, Vladimir Liberman, Michael T. Mocella, B. E. Fischel, Min K. Yang, A. L. Shoe, B. Fones, Weiming Qiu
Publikováno v:
SPIE Proceedings.
To identify the most practical and cost-effective technology after water immersion lithography (Gen1) for sub-45 nm half pitches, the semiconductor industry continues to debate the relative merits of water double patterning (feasible, but high cost o
Autor:
C. Anolick, Robert Clayton Wheland, T. P. Dinoia, Cynthia Asli Mertdogan, Mark A. McHugh, William H. Tuminello
Publikováno v:
Macromolecules. 31:2252-2254
Experimental cloud-point data to 2800 bar and 250 °C are presented for binary mixtures of partially crystalline poly(tetrafluoroethylene-co-19 mol % hexafluoropropylene) (FEP19) and amorphous FEP48 with CF4, CO2, and SF6. It takes less pressure and
Autor:
Sheng Peng, Hoang Vi Tran, Weiming Qiu, M. F. Lemon, Jerald Feldman, Steve J. McLain, Michael Crawford, Min K. Yang, A. L. Shoe, Roger H. French, Robert Clayton Wheland, Doug J. Adelman
Publikováno v:
SPIE Proceedings.
Our studies of second generation immersion fluid candidates are moving beyond the discovery phase, and into addressing issues for their commercial application. Thus, we continue work to examine and fundamentally understand fluid transparency and refr
Autor:
Robert Clayton Wheland, Roger H. French, Nicholas J. Turro, David A. Dixon, Steffen Jockusch, Marius Ivan, Tatjana Widerschpan, Kwangjoo Lee, Jun Li, Paul M. Zimmerman, M. F. Lemon, André M. Braun
Publikováno v:
Journal of the American Chemical Society. 127(23)
The use of 157 nm as the next lower wavelength for photolithography for the production of semiconductors has created a need for transparent and radiation-durable polymers for use in soft pellicles, the polymer films which protect the chip from partic
Autor:
Robert Clayton Wheland, Michael Crawford, Sheng Peng, Roger H. French, Weiming Qiu, M. F. Lemon, Min Yang
Publikováno v:
Optical Microlithography XVIII.
Water is the first generation immersion fluid for 193 nm immersion lithography. With a fluid refractive index of 1.436 and an optical absorbance of 0.01/cm at 193 nm, water immersion technology can enable optical lithography for the ITRS’ 65 nm hal