Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Robert B. Ogle"'
Autor:
Fred T K Cheung, Huicai Zhong, Robert B. Ogle, Brian J. MacDonald, Jeremias D. Romero, Jay Bhakta, Cyrus E. Tabery, Yun Wu, Arvind Halliyal, Cristina Cheung
Publikováno v:
Journal of The Electrochemical Society. 150:G785
Thin silicon nitride films (less than 20 nm) deposited on (100) silicon substrates via low pressure chemical vapor deposition (LPCVD) at three temperatures (730, 760, and 825°C) were analyzed by spectroscopic ellipsometry (SE), attenuated total refl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::903a8960986ab0a651e49e53a7d47d71
https://doi.org/10.1149/1.1624842
https://doi.org/10.1149/1.1624842
Autor:
Robert B. Ogle
Publikováno v:
Symposium: A Quarterly Journal in Modern Literatures. 8:309-320
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b696ad2bf18b1fdfcd170e8b6ceed116
https://doi.org/10.1080/00397709.1954.9955483
https://doi.org/10.1080/00397709.1954.9955483
Autor:
Robert B. Ogle
Publikováno v:
Studies in Romanticism. 20:21
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b384df5aa7759942634dbccadcbbca3
https://doi.org/10.2307/25600279
https://doi.org/10.2307/25600279
Autor:
Robert B. Ogle
Publikováno v:
Studies in Romanticism. 12:436
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9c08baecb310c854519654a7fae76420
https://doi.org/10.2307/25599874
https://doi.org/10.2307/25599874