Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Rob van Gils"'
Publikováno v:
Mechatronics, 79:102647. Elsevier
Active thermal control is crucial in achieving the required accuracy and throughput in many industrial applications, e.g., in the medical, high-power lighting, and semiconductor industry. Thermoelectric Modules (TEMs) can be used to both heat and coo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::88abe52c8cfc9000c054c39304ceafc6
https://research.tue.nl/nl/publications/aa9b57f2-7e0f-4295-a04c-9821f0086ce5
https://research.tue.nl/nl/publications/aa9b57f2-7e0f-4295-a04c-9821f0086ce5
Publikováno v:
2020 DSPE Conference on Precision Mechatronics
Active thermal control is crucial in achieving the required accuracy and throughput in many industrial applications, e.g., in the medical industry, high-power lighting industry, and semiconductor industry. Thermoelectric Modules (TEMs) can be used to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fabb8f180e552980f00ae7f0b580b9fb
Autor:
Rob van Gils
Publikováno v:
2017 23rd International Workshop on Thermal Investigations of ICs and Systems (THERMINIC).
In this study a practically feasible Input-Output linearizing feedback law is introduced and tested on an experimental setup. The test setup is representative of part of a medical handheld diagnostics device, requiring fast and accurate temperature c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5c0e2c2e20a32557a585ed29df83c927
https://doi.org/10.1109/therminic.2017.8233829
https://doi.org/10.1109/therminic.2017.8233829
Autor:
Luigi Scaccabarozzi, Wim van der Zande, Maurice Bogers, Laurens de Winter, Erik Ruinemans, Rob van Gils, Derk Brouns, Hans Vermeulen, Florian Didier Albin Dhalluin, Daniel Smith, Juan Diego Arias Espinoza, Maria Peter, Sven Lentzen, Jack Van der Sanden
Publikováno v:
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII.
EUV pellicle membranes are being pursued to protect scanner images from repeating defects caused by reticle fall-on particle defects. Because most materials highly absorb EUV, pellicle membranes must be ultrathin. In an attempt to increase the streng
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::050ffb75c25838090c8bccbe68c00d72
https://doi.org/10.1117/12.2197454
https://doi.org/10.1117/12.2197454