Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Rob Willekers"'
Autor:
Maarten van Es, Selman Tamer, Elin Bloem, Laurent Fillinger, Elfi van Zeijl, Klára Maturová, Jacques van der Donck, Rob Willekers, Adam Chuang, Diederik Maas
Publikováno v:
Micro and Nano Engineering, Vol 19, Iss , Pp 100181- (2023)
Patterning photoresist with extreme control over dose and placement is the first crucial step in semiconductor manufacturing. However, how can the activation of modern complex resist components be accurately measured at sufficient spatial resolution?
Externí odkaz:
https://doaj.org/article/0653850e95f944f287663f12ba7a92af
Autor:
Maarten van Es, Mehmet Tamer, Robbert Bloem, Laurent Fillinger, Elfi van Zeijl, Klára Maturová, Jacques van der Donck, Rob Willekers, Diederik Maas
Patterning photoresist with extreme control over dose and placement is the first crucial step in semiconductor manufacturing. However, how can the activation of modern complex resist components be accurately measured at sufficient spatial resolution?
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3a700cab3f497d3ad392c57bf97ae51
https://doi.org/10.21203/rs.3.rs-1238936/v2
https://doi.org/10.21203/rs.3.rs-1238936/v2
Autor:
Peter Engblom, Jo Finders, Toralf Gruner, Marcel Hendrikus Maria Beems, Jan Mulkens, Youping Zhang, Hans Bakker, Thijs Hollink, Rob Willekers, Alena Andryzhyieuskaya, Angelique Nachtwein, Frank Staals
Publikováno v:
SPIE Proceedings.
In this paper we describe the basic principle of FlexWave, a new high resolution wavefront manipulator, and discuss experimental data on imaging, focus and overlay. For this we integrated the FlexWave module in a 1.35 NA immersion scanner. With FlexW
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::589417b2d1a9c8c37dc1f5c1edc1f6e6
https://doi.org/10.1117/12.880759
https://doi.org/10.1117/12.880759
Autor:
Jeroen Van de Kerkhove, Jasper Menger, Peter De Bisschop, Edwin Wilhelmus Marie Knols, Guido Schiffelers, Rob Willekers, L. Van Look, Koen Schreel, Joost Bekaert, Geert Vandenberghe
Publikováno v:
Optical Microlithography XXI.
IC manufacturers have a strong demand for transferring a working process from one scanner to another. In an ideal transfer, a reticle set that produces devices within specification on a certain scanner has the same performance on another exposure too
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6cf0818e1063a09d0577512a4c7c4a8a
https://doi.org/10.1117/12.772598
https://doi.org/10.1117/12.772598
Autor:
Hans Van Der Laan, Rob Willekers, Marcel Mathijs Theodore Marie Dierichs, Elaine McCoo, Richard Pongers, Henk van Greevenbroek, Fred Stoffels
Publikováno v:
SPIE Proceedings.
As feature size decreases, factors like lens aberrations and pupil illumination become increasingly important for the lithographer. Both factors can be quantified using the Transmission Image Sensor (TIS), a built-in measurement device on ASML Step &
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d243df7491566914b2a78bb103674303
https://doi.org/10.1117/12.435757
https://doi.org/10.1117/12.435757
Autor:
Arthur Brecht, Marco Hugo Petrus Moers, Kevin Cummings, Mark Zellenrath, Neil A. Beaudry, Rob Willekers, Adriaan Roelof Van Zwol, Wim de Boeij, Hans Van Der Laan
Publikováno v:
SPIE Proceedings.
ARTEMISTM (Aberration Ring Test Exposed at Multiple Illumination Settings) is a technique to determine in-situ, full-field, low and high order lens aberrations. In this paper we are analyzing the ARTEMISTM data of PAS5500/750TM DUV Step & Scan system
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83886dd00b5338799bba0d907f0da945
https://doi.org/10.1117/12.435676
https://doi.org/10.1117/12.435676
Publikováno v:
AIP Conference Proceedings.
The International Technology Roadmap for Semiconductors shows the lithography technology nodes in terms of critical dimension to be reached. This critical dimension is proportional to the ratio of the exposure wavelength (λ) and the numerical apertu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::900a53cede50209a78d09f929f01d267
https://doi.org/10.1063/1.1354422
https://doi.org/10.1063/1.1354422
Publikováno v:
AIP Conference Proceedings; 2001, Vol. 550 Issue 1, p339, 7p