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pro vyhledávání: '"Rob Snel"'
Autor:
Rob Snel
Publikováno v:
Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation III.
Break through large astronomical telescopes of the near future (ELT, TMT, MSE, LOT, etc.) will be comprised of extremely large optical elements, requiring segmented primary mirrors. Optical performance of the primary mirror requires an optical shape
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f2d3ce9a20a71d7c54d8fc87923ea64
https://doi.org/10.1117/12.2312469
https://doi.org/10.1117/12.2312469
Publikováno v:
Lehmann, P.Goncalves, A.A.Osten, W., Optical Measurement Systems for Industrial Inspection X, 2017, 26-29 June 2017, 10329
Contemporary production systems of mechanical precision parts show challenges as increased complexity, tolerances shrinking to sub-microns and yield losses that must be mastered to the extreme. More advanced automation and process control is required
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::31947d42153fbf90034d485cda9af9e6
http://resolver.tudelft.nl/uuid:6cf955d2-cf46-4889-9063-55cbe4f81d0c
http://resolver.tudelft.nl/uuid:6cf955d2-cf46-4889-9063-55cbe4f81d0c
Autor:
Sander van Reek, Jetske Stortelder, Rob Snel, Sjoerd Oostrom, Alfred Abutan, Bert van der Zwan, Jacques van der Donck, Peter van der Walle
Publikováno v:
Extreme Ultraviolet (EUV) Lithography II, 28 February 2011 through 3 March 2011, San Jose, CA, USA, 7969
Since 2006 EUV Lithographic tools have been available for testing purposes giving a boost to the development of fab infrastructure for EUV masks. The absence of a pellicle makes the EUV reticles extremely vulnerable to particles. Therefore, the fab i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4676eb14d576fdefc2617771306192c7
http://resolver.tudelft.nl/uuid:d6769fe6-36d5-4176-92c6-8aafb0e127bb
http://resolver.tudelft.nl/uuid:d6769fe6-36d5-4176-92c6-8aafb0e127bb