Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Rob DeLancey"'
Autor:
Enas Sakr, Rob DeLancey, Wolfgang Hoppe, Zac Levinson, Robert Iwanow, Ryan Chen, Delian Yang, Kevin Lucas
Publikováno v:
DTCO and Computational Patterning II.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1be487b9876c068b963bfe6c386259f2
https://doi.org/10.1117/12.2658720
https://doi.org/10.1117/12.2658720
Publikováno v:
DTCO and Computational Patterning II.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e324e6bbedd697147200a9cb1d0bad87
https://doi.org/10.1117/12.2660580
https://doi.org/10.1117/12.2660580
Publikováno v:
Optical Microlithography XXXIV.
PTD photoresists are still the main type of photoresists used for tight pitch layers in advanced patterning. Recent experimental results show evidence that the same mechanical deformation behaviors seen in NTD photoresist process also exist in PTD ph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::511ba3a7f1ce2db5a93343c94788956b
https://doi.org/10.1117/12.2584781
https://doi.org/10.1117/12.2584781
Publikováno v:
International Symposium on Microelectronics. 2014:000905-000911
Advanced process technology is required to develop and enable mass production of high-density 3D and 2.5D interconnect technologies. In this paper, Canon and IBM @ Albany NanoTech will present process optimization results for lithography applications
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3d6ecaccf213fdc6ffbe05fde221097d
https://doi.org/10.4071/isom-thp55
https://doi.org/10.4071/isom-thp55