Zobrazeno 1 - 1
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pro vyhledávání: '"Riyadh N. Talaq"'
Publikováno v:
Engineering and Technology Journal, Vol 33, Iss 6B, Pp 1082-1092 (2015)
Nickel oxide (NiO) films were deposited by using a homemade DC reactive magnetron sputtering system at different working pressure in the range (0.05-0.14)mbar. The effect of working pressure on the structure, surface morphology, optical of NiO films
Externí odkaz:
https://doaj.org/article/205fe502ba3e4ccfbb0a3f127f6d52ed
