Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Ritala, Heini"'
Publikováno v:
In Microelectronic Engineering 2010 87(3):501-504
Autor:
Ritala, Heini, Tuohiniemi, Mikko
Publikováno v:
Ritala, H & Tuohiniemi, M 2012, ' Study on Al 2 O 3 film in anhydrous HF vapor ', Solid State Phenomena, pp. 45-48 . https://doi.org/10.4028/www.scientific.net/SSP.187.45
HF vapor etching using thin Al2O3 film as etch stop material was studied. It was found that behavior of Al2O3 film in HF vapor can not be predicted from the blanket film studies only but it is important to use samples that resemble closely real proce
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=355e65625b88::eea8b4085392172955f8bc0e50aadece
https://cris.vtt.fi/en/publications/8828740b-f56a-49e6-b81a-68b22339c01b
https://cris.vtt.fi/en/publications/8828740b-f56a-49e6-b81a-68b22339c01b
Publikováno v:
Vehmas, T, Ritala, H & Anttila, O 2004, Effect of surfactants on particle contamination of silicon surface in HF solutions . in J Ruzyllo, T Hattori, R L Opila & R E Novak (eds), Cleaning Technology in Semiconductor Device Manufacturing VIII : Proceedings of the International Symposium . Electrochemical Society ECS, ECS Proceedings Volumes, vol. 2003-26, pp. 195-202, 8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, Orlando, Florida, United States, 12/10/03 .
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=355e65625b88::5ea9006910e83ab5ed460420194f7de7
https://cris.vtt.fi/en/publications/f9888845-6723-4b5f-a2a8-245689891ed0
https://cris.vtt.fi/en/publications/f9888845-6723-4b5f-a2a8-245689891ed0
Autor:
Kiihamäki, Jyrki, Kattelus, Hannu, Blomberg, Martti, Puurunen, Riikka, Laamanen, Mari, Pekko, Panu, Saarilahti, Jaakko, Ritala, Heini, Rissanen, Anna
Publikováno v:
Advanced Materials & Technologies for Micro/Nano-Devices, Sensors & Actuators; 2010, p167-178, 12p
Autor:
Ritala, Heini, Tuohiniemi, Mikko
Publikováno v:
Diffusion and Defect Data Part B: Solid State Phenomena; April 2012, Vol. 187 Issue: 1 p45-48, 4p
Autor:
Ritala, Heini, Kiihamaki, Jyrki
Publikováno v:
ECS Transactions; September 2009, Vol. 25 Issue: 5 p351-358, 8p
Autor:
Ritala, Heini, Eränen, Simo, Kiviranta, Arto, Räsänen, Jaakko, Tarkiainen, Virpi, Kiuru, Jari, Ketola, Raimo A.
Publikováno v:
Diffusion and Defect Data Part B: Solid State Phenomena; April 2005, Vol. 103 Issue: 1 p209-212, 4p
Akademický článek
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