Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Rikhit Arora"'
Autor:
Richard B. Pollard, Rikhit Arora
Publikováno v:
Journal of The Electrochemical Society. 138:1523-1537
This paper reports on a mode for the simultaneous reaction kinetics and transport processes in chemical vapor deposition (CVD) reactors extended to treat deposition of materials that have a broad range of surface characteristics, e.g. sites with mult
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::be211706d6862f5813fae91b36aae8ca
https://doi.org/10.1149/1.2085820
https://doi.org/10.1149/1.2085820
Publikováno v:
MRS Proceedings. 282
In this work, a hydrogen (H2) reduction process has been developed which gives tungsten (W) nucleation on titanium nitride (TiN) adhesion layers with a very short incubation time, eliminating the need for a silane (SiH4reduced seed layer. The nucleat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d87c61dc753eebc93a517503f61df602
https://doi.org/10.1557/proc-282-365
https://doi.org/10.1557/proc-282-365
Periodical
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Autor:
Hillman, Joseph, Foster, Robert
Publikováno v:
Solid State Technology. Jul95, Vol. 38 Issue 7, p147. 4p. 2 Black and White Photographs, 1 Diagram, 7 Graphs.