Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Rik van Laarhoven"'
Autor:
Christina L. Porter, Teis Coenen, Niels Geypen, Sandy Scholz, Loes van Rijswijk, Han-Kwang Nienhuys, Jeroen Ploegmakers, Johan Reinink, Hugo Cramer, Rik van Laarhoven, David O'Dwyer, Peter Smorenburg, Andrea Invernizzi, Ricarda Wohrwag, Hugo Jonquiere, Juliane Reinhardt, Omar El Gawhary, Simon G. J. Mathijssen, Peter D. Engblom, Heidi Chin, William T. Blanton, Sury Ganesan, Brian J. Krist, Florian Gstrein, Mark Phillips
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b27f24e445e7420276b78ecc827d09a6
https://doi.org/10.1117/12.2658495
https://doi.org/10.1117/12.2658495
Autor:
Milos Popadic, Wade Huang, R.K. Jaganatharaja, Isabel de la Fuente, Ward Tu, Hugo Augustinus Joseph Cramer, Elliott Mc Namara, Rik van Laarhoven, Sharon Hsu, Filippo Belletti
Publikováno v:
SPIE Proceedings.
The logic manufacturing process requires small in-device metrology targets to exploit the full dose correction potential of the modern scanners and process tools. A high-NA angular resolved scatterometer (YieldStar S-1250D) was modified to demonstrat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a5f13a4efb8896028aa8ff347080ea4d
https://doi.org/10.1117/12.2260268
https://doi.org/10.1117/12.2260268