Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Rick Levesque"'
Autor:
Raymond F. Smith, Ronnie Shepherd, Jaroslav Kuba, Alan J Wootton, Vyacheslav N. Shlyaptsev, Todd Ditmire, Gilliss Dyer, Rick Levesque, Saša Bajt, Richard A. London, Rex Booth, Mark A. McKernan, James Dunn, Richard M. Bionta, Michael D. Feit, Ernst E. Fill
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 507:475-478
Free electron lasers operating in the 0.1–1.5 nm wavelength range have been proposed for the Stanford Linear Accelerator Center (USA) and DESY (Germany). The unprecedented brightness and associated fluence (up to 30 J cm−2) predicted for pulses <
Publikováno v:
NIP & Digital Fabrication Conference. 17:167-170
Publikováno v:
NIP & Digital Fabrication Conference. 17:175-178
Autor:
Todd Ditmire, Jaroslav Kuba, Mark A. McKernan, Rick Levesque, Gilliss Dyer, James Dunn, Michael D. Feit, Raymond F. Smith, Ronnie Shepherd, Alan J Wootton, Richard A. London, Vyacheslav N. Shlyaptsev, Ronald H. Conant, Richard M. Bionta, Ernst E. Fill, Saša Bajt
Publikováno v:
AIP Conference Proceedings.
Free electron lasers operating in the 0.1 to 1.5 nm wavelength range have been proposed for the Stanford Linear Accelerator Center (USA) and DESY (Germany). The unprecedented brightness and associated fluence predicted for pulses
Autor:
Douglas Bugner, Richard Van Hanehem, Michelle Oakland, Peter Artz, Daniel Zaccour, Rick Levesque
Publikováno v:
Journal of Imaging Science and Technology. 49:317-ID
Autor:
Mourad Idir, Rick Levesque, Seongtae Jeong, Pei-yang Yan, Patrick A. Kearney, Paul Denham, Michael S. Jones, Yun Lin, Jeffrey Bokor, Eric M. Gullikson, Lewis Johnson, James H. Underwood, Seno Rekawa, Phil Batson
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 16:3430
We report the design and operation of an at-wavelength system for extreme ultraviolet lithography mask blank defect detection. Initial results demonstrate sensitivity to submicron size phase defects. The performance of the system is compared with the
Conference
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