Výsledky vyhledávání - "Rick Levesque"

X-ray optics research for free electron lasers: study of material damage under extreme fluxes

Autor: Raymond F. Smith, Ronnie Shepherd, Jaroslav Kuba, Alan J Wootton, Vyacheslav N. Shlyaptsev, Todd Ditmire, Gilliss Dyer, Rick Levesque, Saša Bajt, Richard A. London, Rex Booth, Mark A. McKernan, James Dunn, Richard M. Bionta, Michael D. Feit, Ernst E. Fill

Publikováno v: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. 507:475-478

Free electron lasers operating in the 0.1–1.5 nm wavelength range have been proposed for the Stanford Linear Accelerator Center (USA) and DESY (Germany). The unprecedented brightness and associated fluence (up to 30 J cm−2) predicted for pulses <

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::68dee4820c43f5f82332295fff945e38
https://doi.org/10.1016/s0168-9002(03)00899-4

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X-ray Optics Research for Linac Coherent Light Source: Interaction of Ultra-short X-ray Pulses with Matter

Autor: Todd Ditmire, Jaroslav Kuba, Mark A. McKernan, Rick Levesque, Gilliss Dyer, James Dunn, Michael D. Feit, Raymond F. Smith, Ronnie Shepherd, Alan J Wootton, Richard A. London, Vyacheslav N. Shlyaptsev, Ronald H. Conant, Richard M. Bionta, Ernst E. Fill, Saša Bajt

Publikováno v: AIP Conference Proceedings.

Free electron lasers operating in the 0.1 to 1.5 nm wavelength range have been proposed for the Stanford Linear Accelerator Center (USA) and DESY (Germany). The unprecedented brightness and associated fluence predicted for pulses

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::d77cba1730a94fefecc2e66f194362b6
https://doi.org/10.1063/1.1521083

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At-wavelength detection of extreme ultraviolet lithography mask blank defects

Autor: Mourad Idir, Rick Levesque, Seongtae Jeong, Pei-yang Yan, Patrick A. Kearney, Paul Denham, Michael S. Jones, Yun Lin, Jeffrey Bokor, Eric M. Gullikson, Lewis Johnson, James H. Underwood, Seno Rekawa, Phil Batson

Publikováno v: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 16:3430

We report the design and operation of an at-wavelength system for extreme ultraviolet lithography mask blank defect detection. Initial results demonstrate sensitivity to submicron size phase defects. The performance of the system is compared with the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::2dccd47c00f3fccf0fc73ac03dc9fb60
https://doi.org/10.1116/1.590473

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