Zobrazeno 1 - 1
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pro vyhledávání: '"Richard Versulis"'
Autor:
Jacques van der Donck, Diederik Maas, Peter van der Walle, Pragati Kumar, Richard Versulis, Dmitry Ityaksov, O. Kievit, Jochem Janssen
Publikováno v:
SPIE Proceedings.
TNO has developed the Rapid Nano scanner to detect nanoparticles on EUVL mask blanks. This scanner was designed to be used in particle qualifications of EUV reticle handling equipment. In this paper we present an end-to-end model of the Rapid Nano de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eeeb90ba6a6c9d0d6bac9d9da7c95e26
https://doi.org/10.1117/12.2006408
https://doi.org/10.1117/12.2006408
