Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Richard Tiberio"'
Autor:
Huixiong Dai, Xiangyu Chen, He Yi, Yongmei Chen, Li-Wen Chang, James Conway, Jie Zhang, Richard Tiberio, Xinyu Bao, Subhasish Mitra, H.-S. Philip Wong, Christopher Dennis Bencher
Publikováno v:
Advanced Materials. 24:3107-3114
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::10c7aad449d496f1798c61d0f6dd6203
https://doi.org/10.1002/adma.201200265
https://doi.org/10.1002/adma.201200265
Autor:
Hon-Sum Philip Wong, Richard Tiberio, He Yi, Joost Bekaert, Roel Gronheid, Maryann C. Tung, Kye Okabe
Publikováno v:
Alternative Lithographic Technologies VII.
In this paper we address an important topic for the development of block copolymer directed self assembly, which is the lack of the third dimensional information. The three-dimensional shape of the DSA feature directly impacts the ability to transfer
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::edcf3bfd06a9436c817766a26db83e75
https://doi.org/10.1117/12.2087569
https://doi.org/10.1117/12.2087569
Publikováno v:
Nano letters. 15(2)
Directed self-assembly (DSA) is a promising lithography candidate for technology nodes beyond 14 nm. Researchers have shown contact hole patterning for random logic circuits using DSA with small physical templates. This paper introduces an alphabet a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6f6adf9a02ab92e3c3f3245ed005b4c2
https://pubmed.ncbi.nlm.nih.gov/25551471
https://pubmed.ncbi.nlm.nih.gov/25551471
Publikováno v:
Alternative Lithographic Technologies V.
Block copolymer (BCP) directed self-assembly (DSA) is a promising extension of optical lithography for patterning irregularly positioned contact holes of integrated circuits. The small topographical templates are shown to guide the self-assembly off
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a9fbbb741dd32ed0afdf0cfed5472309
https://doi.org/10.1117/12.2011263
https://doi.org/10.1117/12.2011263
Autor:
Li-Wen Chang, Subhasish Mitra, H.-S. Philip Wong, He Yi, Jie Zhang, James Conway, Xinyu Bao, Richard Tiberio
Publikováno v:
Alternative Lithographic Technologies IV.
Block copolymer directed self-assembly (DSA) is a promising extension of optical lithography for device fabrication akin to double-patterning. The irregular distribution of contact holes in circuit layouts is one of the biggest challenges for DSA pat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4b758fc4c19e6248f0f1ab13f98bb28a
https://doi.org/10.1117/12.912804
https://doi.org/10.1117/12.912804
Autor:
Richard Tiberio, Shinya Inoué, Andreas Stemmer, Rudolf Oldenbourg, Michael Skvarla, Guang Mei
Publikováno v:
Collected Works of Shinya Inoué ISBN: 9789812703880
Collected Works of Shinya Inoué: Microscopes, Living Cells, and Dynamic Molecules (With DVD-ROM)
Collected Works of Shinya Inoué: Microscopes, Living Cells, and Dynamic Molecules (With DVD-ROM)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a6173b120941113e44b62e57aaeb1640
https://doi.org/10.1142/9789812790866_0059
https://doi.org/10.1142/9789812790866_0059
Autor:
Huixiong Dai, He Yi, Xiangyu Chen, Xinyu Bao, Subhasish Mitra, H.-S. Philip Wong, Richard Tiberio, Jie Zhang, Li-Wen Chang, Yongmei Chen, James Conway, Christopher Dennis Bencher
Publikováno v:
Advanced Materials. 24:3082-3082
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a9a40c9f1c4472001cb3e6e2026dc59
https://doi.org/10.1002/adma.201290134
https://doi.org/10.1002/adma.201290134
Conference
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.